SCHEMBL22097548

SCHEMBL22097548

O=C(NS(=O)(=O)C(F)(F)F)c1c(I)ccc(I)c1I

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ MAPK1 P28482 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ CA2 P00918 4/20 0.35
▸ SCN5A Q14524 1/20 0.33
▸ SCN9A Q15858 1/20 0.33
▸ CA1 P00915 2/20 0.32
▸ CCR2 P41597 2/20 0.32
▸ PTPN1 P18031 1/20 0.31
▸ PTGFR P43088 1/20 0.30
▸ RXFP1 Q9HBX9 1/20 0.30
▸ PTPN11 Q06124 1/20 0.30
▸ VCP P55072 1/20 0.30
▸ MCL1 Q07820 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097550 0.85 MAPK1 (0.34) MAPK1SMN1; SMN2CA2SCN5ASCN9A
SCHEMBL22789846 0.85 RXFP1 (0.39) MAPK1SMN1; SMN2CA2SCN5ASCN9A
SCHEMBL22097535 0.80 TRPV1 (0.37) SCN5ASCN9APTPN1PTGFRVCP
SCHEMBL22097549 0.77 KMT2A (0.36) SMN1; SMN2
SCHEMBL22097546 0.75 MMP2 (0.32) CA2CA1
SCHEMBL22403149 0.74 RXFP1 (0.36) MAPK1SMN1; SMN2CA2SCN5ASCN9A
SCHEMBL22503119 0.72 TRPV1 (0.50) CA2SCN5ASCN9ACA1PTPN1
SCHEMBL22503312 0.72 KMT2A (0.46) —
SCHEMBL22503182 0.71 CES2 (0.36) MAPK1SMN1; SMN2CA2SCN5ASCN9A
SCHEMBL17693112 0.71 HTT (0.41) MAPK1SMN1; SMN2CA2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 — — US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
Send feedback