SCHEMBL2211329

SCHEMBL2211329

C1CCn2nnnc2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9691951-B2 Curable silicone composition, and optical semiconductor device DOW CORNING TORAY CO., LTD. (JP) 2017-06-27 US claimed
EP-3059768-A1 CURABLE SILICONE COMPOSITION, AND OPTICAL SEMICONDUCTOR DEVICE Dow Corning Toray Co., Ltd. (JP) 2016-08-24 EP claimed
US-20160233395-A1 Curable Silicone Composition, And Optical Semiconductor Device DOW TORAY CO., LTD. (JP) 2016-08-11 US claimed
US-20040254158-A1 Anticoagulants; atherosclerosis; strokes; thrombosis; cardiovascular disorders BRISTOL-MYERS SQUIBB COMPANY 2004-12-16 US claimed
US-11446398-B2 Regulated biocircuit systems OBSIDIAN THERAPEUTICS, INC. (US) 2022-09-20 US disclosed
US-9691951-B2 Curable silicone composition, and optical semiconductor device DOW CORNING TORAY CO., LTD. (JP) 2017-06-27 US disclosed
EP-3059768-A1 CURABLE SILICONE COMPOSITION, AND OPTICAL SEMICONDUCTOR DEVICE Dow Corning Toray Co., Ltd. (JP) 2016-08-24 EP disclosed
US-20160233395-A1 Curable Silicone Composition, And Optical Semiconductor Device DOW TORAY CO., LTD. (JP) 2016-08-11 US disclosed
EP-1952918-B1 METHOD FOR PRODUCING METAL PARTICLE DISPERSION, CONDUCTIVE INK USING METAL PARTICLE DISPERSION PRODUCED BY SUCH METHOD, AND CONDUCTIVE COATING FILM TOYO INK MFG CO (JP) 2013-05-22 EP disclosed
US-8440110-B2 Method for producing metal particle dispersion, conductive ink using metal particle dispersion produced by such method, and conductive coating film TOYO INK MFG CO., LTD. (JP) 2013-05-14 US disclosed
US-20110175040-A1 METHOD FOR PRODUCING METAL PARTICLE DISPRESION, CONDUCTIVE INK USING METAL PARTICLE DISPERSION PRODUCED BY SUCH METHOD, AND CONDUCTIVE COATING FILM TOYO INK MFG CO., LTD. (JP) 2011-07-21 US disclosed
US-7981327-B2 Method for producing metal particle dispersion, conductive ink using metal particle dispersion produced by such method, and conductive coating film TOYO INK MFG. CO. LTD. (JP) 2011-07-19 US disclosed
US-7659281-B2 HMG-CoA reductase inhibitors BRISTOL-MYERS SQUIBB COMPANY (US) 2010-02-09 US disclosed
US-20090258202-A1 Method for Producing Metal Particle Dispersion, Conductive Ink Using Metal Particle Dispersion Produced by Such Method, and Conductive Coating Film GVP GESELLSCHAFT ZUR VERMARKTUNG DER PORENBRENNERTECHNIK MBH (DE) 2009-10-15 US disclosed
EP-1952918-A1 METHOD FOR PRODUCING METAL PARTICLE DISPERSION, CONDUCTIVE INK USING METAL PARTICLE DISPERSION PRODUCED BY SUCH METHOD, AND CONDUCTIVE COATING FILM Toyo Ink Mfg. Co., Ltd (JP) 2008-08-06 EP disclosed
US-7312214-B2 1, 1-disubstituted cycloalkyl derivatives as factor Xa inhibitors BRISTOL-MYERS SQUIBB COMPANY (US) 2007-12-25 US disclosed
US-20070249583-A1 HMG-CoA reductase inhibitors BRISTOL-MYERS SQUIBB COMPANY 2007-10-25 US disclosed
US-20070249583-A1 HMG-CoA reductase inhibitors BRISTOL-MYERS SQUIBB COMPANY 2007-10-25 US disclosed
US-20070249583-A1 HMG-CoA reductase inhibitors BRISTOL-MYERS SQUIBB COMPANY 2007-10-25 US disclosed
US-20040254158-A1 Anticoagulants; atherosclerosis; strokes; thrombosis; cardiovascular disorders BRISTOL-MYERS SQUIBB COMPANY 2004-12-16 US disclosed