⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19502097 | 0.87 | MMP8 (0.33) | — | |
| SCHEMBL24284446 | 0.80 | GAA (0.31) | — | |
| SCHEMBL19648485 | 0.77 | — | — | |
| SCHEMBL25486585 | 0.72 | — | — | |
| SCHEMBL21388034 | 0.70 | TDP1 (0.37) | — | |
| SCHEMBL19621137 | 0.68 | HTR6 (0.47) | — | |
| SCHEMBL23021651 | 0.68 | — | — | |
| SCHEMBL13909328 | 0.67 | HTR6 (0.45) | — | |
| SCHEMBL7117901 | 0.66 | KEAP1 (0.48) | — | |
| SCHEMBL24592682 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020129476-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2020-06-25 | — | — | WO | disclosed |