Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CEL | P19835 | 2/20 | 0.46 |
| ▸ | BCHE | P06276 | 8/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.41 |
| ▸ | CYSLTR2 | Q9NS75 | 1/20 | 0.41 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.40 |
| ▸ | ACHE | P22303 | 2/20 | 0.37 |
| ▸ | CXCR4 | P61073 | 1/20 | 0.37 |
| ▸ | KDM1A | O60341 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9529506 | 0.77 | BCHE (0.66) | CELBCHESLC6A4SIGMAR1 | |
| SCHEMBL2112328 | 0.73 | SIGMAR1 (0.60) | SIGMAR1 | |
| SCHEMBL18978572 | 0.73 | SIGMAR1 (0.60) | SIGMAR1 | |
| SCHEMBL19465402 | 0.72 | BCHE (0.49) | CELBCHESLC6A4SIGMAR1ACHE | |
| SCHEMBL9133794 | 0.71 | CEL (0.55) | CELBCHEMCL1CYSLTR2CYSLTR1 | |
| SCHEMBL13460042 | 0.71 | SIGMAR1 (0.56) | CELSIGMAR1 | |
| SCHEMBL18978574 | 0.71 | SIGMAR1 (0.56) | SIGMAR1 | |
| SCHEMBL16593849 | 0.70 | CYP1A2 (0.52) | CELBCHECYSLTR2CYSLTR1SIGMAR1 | |
| SCHEMBL7392307 | 0.69 | SIGMAR1 (0.64) | MCL1CYSLTR2CYSLTR1SIGMAR1 | |
| SCHEMBL5087578 | 0.69 | SIGMAR1 (0.64) | MCL1CYSLTR2CYSLTR1SIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020129476-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2020-06-25 | — | — | WO | disclosed |