SCHEMBL22147377

SCHEMBL22147377

Oc1ccc(-c2c(-c3ccc(-c4c(-c5ccc(O)cc5)c(-c5ccccc5)c5c(c4-c4ccccc4)-c4cccc6cccc-5c46)cc3)c(-c3ccccc3)c3c(c2-c2ccccc2)-c2cccc4cccc-3c24)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 1/20 0.50
BCL2L1 Q07817 1/20 0.50
ALDH1A1 P00352 2/20 0.45
TSHR P16473 2/20 0.45
MAPK1 P28482 2/20 0.45
HSD17B10 Q99714 2/20 0.45
ATM Q13315 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
ESR1 P03372 7/20 0.45
ESR2 Q92731 6/20 0.45
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
PDE4A P27815 2/20 0.42
PDE4B Q07343 2/20 0.42
PDE4C Q08493 2/20 0.42
PDE4D Q08499 2/20 0.42
NTSR1 P30989 1/20 0.42
ABL1 P00519 1/20 0.41
ABCB1 P08183 1/20 0.41
BCR P11274 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL728324 0.88 ALDH1A1 (0.56) ALDH1A1TSHRMAPK1HSD17B10ATM
SCHEMBL728300 0.81 ALDH1A1 (0.50) ALDH1A1TSHRMAPK1HSD17B10ATM
SCHEMBL24067717 0.80 HSD17B10 (0.54) ALDH1A1TSHRMAPK1HSD17B10ATM
SCHEMBL22147379 0.79 MMP3 (0.78) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL22147351 0.79 MMP3 (0.78) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL20323157 0.79 MMP3 (0.78) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL20323048 0.79 MMP3 (0.78) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL28979295 0.79 MMP3 (0.78) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL503284 0.79 ALDH1A1 (0.50) ALDH1A1TSHRMAPK1HSD17B10ATM
SCHEMBL24190998 0.79 ALDH1A1 (0.50) ALDH1A1TSHRMAPK1HSD17B10ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200201185-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2020-06-25 US disclosed