SCHEMBL22156268

SCHEMBL22156268

O=C(c1ccc(O)cc1)c1cc(O)c(O)cc1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIG1 P18858 1/20 0.59
MAPT P10636 5/20 0.58
HPGD P15428 4/20 0.58
LMNA P02545 4/20 0.58
HTT P42858 2/20 0.58
ESR1 P03372 1/20 0.58
ESR2 Q92731 1/20 0.58
PKM P14618 1/20 0.58
MEN1 O00255 3/20 0.55
KMT2A Q03164 3/20 0.55
USP2 O75604 1/20 0.55
GAA P10253 1/20 0.55
KEAP1 Q14145 1/20 0.55
NFE2L2 Q16236 1/20 0.55
ALDH1A1 P00352 3/20 0.51
SMN1; SMN2 Q16637 2/20 0.51
NPC1 O15118 1/20 0.51
TP53 P04637 1/20 0.51
TDP1 Q9NUW8 2/20 0.50
SRD5A2 P31213 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18241775 0.84 HTT (0.55) LIG1MAPTHPGDLMNAHTT
SCHEMBL29375096 0.83 MEN1 (0.78) LIG1MAPTHPGDLMNAHTT
SCHEMBL30063097 0.83 LIG1 (0.64) LIG1MAPTHPGDLMNAHTT
SCHEMBL6374935 0.83 LIG1 (0.64) LIG1MAPTHPGDLMNAHTT
SCHEMBL93420 0.83 MEN1 (0.78) LIG1MAPTHPGDLMNAHTT
SCHEMBL170272 0.83 LMNA (0.66) LIG1MAPTHPGDLMNAHTT
SCHEMBL19003399 0.83 CA12 (0.56) MAPTHPGDLMNAGAAPOLB
SCHEMBL30063117 0.83 LMNA (0.66) LIG1MAPTHPGDLMNAHTT
SCHEMBL10354488 0.81 MEN1 (0.75) LIG1MAPTHPGDLMNAHTT
SCHEMBL7551892 0.80 CA12 (0.61) LIG1MAPTHPGDLMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12044969-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-12044969-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-20220146939-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
CN-110037932-B Preparation method and application of hydroxyl-containing ultraviolet absorbent 广东聚石化学股份有限公司 2022-04-01 CN disclosed
US-11287741-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2022-03-29 US disclosed
US-20210311396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2021-10-07 US disclosed
US-20200201184-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2020-06-25 US disclosed