SCHEMBL22160031

SCHEMBL22160031

O[C]1c2cccc3cccc(c23)C1O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.43
HSD17B10 Q99714 8/20 0.43
MEN1 O00255 6/20 0.43
KMT2A Q03164 6/20 0.43
CYP3A4 P08684 4/20 0.43
CYP2D6 P10635 3/20 0.43
MAPT P10636 3/20 0.43
CYP2C9 P11712 3/20 0.43
CYP2C19 P33261 3/20 0.43
TP53 P04637 2/20 0.43
KDM4E B2RXH2 2/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
TSHR P16473 4/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
MAPK1 P28482 2/20 0.39
ATM Q13315 2/20 0.39
PABPC1 P11940 2/20 0.37
RXFP1 Q9HBX9 2/20 0.37
HPGD P15428 5/20 0.37
CYP1A2 P05177 3/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17230351 0.79 HSD17B10 (0.51) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL6880786 0.78 ALDH1A1 (0.45) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL17230350 0.75 ALDH1A1 (0.50) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL27569821 0.72 MEN1 (0.43) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL9323927 0.71 GABRA1 (0.40) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL20698681 0.71 ALDH1A1 (0.42) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL4563908 0.68 MEN1 (0.35) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL638575 0.67 ALDH1A1 (0.45) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL638576 0.67 ALDH1A1 (0.45) ALDH1A1HSD17B10MEN1KMT2ACYP3A4
SCHEMBL638574 0.67 ALDH1A1 (0.45) ALDH1A1HSD17B10MEN1KMT2ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110713588-B Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2022-08-09 CN claimed
US-11214678-B2 Hardmask composition, hardmask layer and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-04 US claimed
CN-110713588-A Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2020-01-21 CN claimed
CN-110713588-B Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2022-08-09 CN disclosed
US-11220570-B2 Polymer, hardmask composition, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-11 US disclosed
US-11214678-B2 Hardmask composition, hardmask layer and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-04 US disclosed
CN-111378084-A Polymer and hardmask composition and method of forming a pattern 三星SDI株式会社 2020-07-07 CN disclosed
US-20200207902-A1 POLYMER, HARDMASK COMPOSITION, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2020-07-02 US disclosed
CN-110713588-A Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2020-01-21 CN disclosed