SCHEMBL2217827

SCHEMBL2217827

CC(C)(C)OC(=O)c1c(O)ccc2ccccc12

nearest known ligand 0.57

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 5/20 0.47
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
PTPN22 Q9Y2R2 1/20 0.43
MAPT P10636 1/20 0.43
ATM Q13315 1/20 0.42
KDM4E B2RXH2 2/20 0.41
ALDH1A1 P00352 2/20 0.41
GLA P06280 1/20 0.41
GAA P10253 1/20 0.41
HPGD P15428 1/20 0.41
HSD17B10 Q99714 1/20 0.41
NCEH1 Q6PIU2 1/20 0.41
ERN1 O75460 1/20 0.41
POLB P06746 1/20 0.41
IDO1 P14902 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7633074 0.84 MEN1 (0.42) ABCG2MEN1KMT2AMAPTATM
SCHEMBL13301683 0.83 KMT2A (0.41) ABCG2MEN1KMT2AMAPTATM
SCHEMBL28697326 0.83 GRM6 (0.45) ABCG2MEN1KMT2AMAPTATM
SCHEMBL1638703 0.81 CA12 (0.60) ABCG2MEN1KMT2APTPN22MAPT
SCHEMBL482475 0.81 ALDH1A1 (0.53) ABCG2MEN1KMT2AMAPTATM
SCHEMBL28406199 0.81 WDR5 (0.51) ABCG2MEN1KMT2AMAPTATM
SCHEMBL10880498 0.81 ABCG2 (0.53) ABCG2MEN1KMT2APTPN22MAPT
SCHEMBL6349586 0.80 CA12 (0.45) MAPTKDM4EALDH1A1GLAGAA
SCHEMBL7753553 0.79 CA12 (0.59) MEN1KMT2AMAPTATMKDM4E
SCHEMBL23259523 0.78 ABCG2 (0.50) ABCG2MEN1KMT2APTPN22KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
CN-108774127-A A kind of method of asymmetric synthesis of chirality 2 (1H)-naphthalene ketone compounds of bromo 浙江工业大学 2018-11-09 CN disclosed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed