SCHEMBL22200938

SCHEMBL22200938

C=C(C)C(=O)Nc1ccc(O)c(F)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.53
▸ RXFP1 Q9HBX9 1/20 0.50
▸ POLB P06746 3/20 0.48
▸ L3MBTL1 Q9Y468 2/20 0.48
▸ RECQL P46063 1/20 0.48
▸ BLM P54132 1/20 0.48
▸ BAZ1A Q9NRL2 1/20 0.44
▸ NPC1 O15118 5/20 0.43
▸ RAB9A P51151 5/20 0.43
▸ SMN1; SMN2 Q16637 3/20 0.43
▸ MAPT P10636 2/20 0.43
▸ LMNA P02545 1/20 0.41
▸ JAK3 P52333 2/20 0.39
▸ S1PR1 P21453 1/20 0.38
▸ PKM P14618 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ HPGD P15428 1/20 0.38
▸ TSHR P16473 1/20 0.38
▸ KDM4E B2RXH2 1/20 0.38
▸ ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21050613 0.84 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL30853148 0.84 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL1136776 0.82 PKM (0.54) TDP1POLBL3MBTL1NPC1RAB9A
SCHEMBL29142697 0.82 TDP1 (0.51) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL26348232 0.81 TDP1 (0.46) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL10864160 0.81 POLB (0.55) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22200937 0.81 TDP1 (0.54) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL15782653 0.81 TDP1 (0.54) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL26348237 0.81 TDP1 (0.49) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22200948 0.80 TDP1 (0.53) TDP1RXFP1POLBL3MBTL1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20200218154-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-09 — — US disclosed
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