SCHEMBL25701255

SCHEMBL25701255

CC1C2CC3(F)C(=O)OC1C3O2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25701242 0.77 UBE2D3 (0.31) —
SCHEMBL17853715 0.77 UBE2D3 (0.31) —
SCHEMBL25701252 0.76 — —
SCHEMBL22201021 0.72 — —
SCHEMBL25701213 0.67 — —
SCHEMBL25701218 0.66 — —
SCHEMBL18845155 0.65 — —
SCHEMBL25701214 0.64 — —
SCHEMBL25701254 0.64 — —
SCHEMBL25701216 0.61 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230205084-A1 RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2023-06-29 — — US disclosed
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