Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | CETP | P11597 | 3/20 | 0.33 |
| ▸ | MBOAT4 | Q96T53 | 1/20 | 0.33 |
| ▸ | CTSL | P07711 | 2/20 | 0.32 |
| ▸ | CTSS | P25774 | 2/20 | 0.32 |
| ▸ | CTSK | P43235 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2219388 | 0.90 | ALDH1A1 (0.36) | ALDH1A1L3MBTL1CTSLLMNAPRTN3 | |
| SCHEMBL8942785 | 0.87 | TSHR (0.47) | ALDH1A1TDP1L3MBTL1CYP3A4TSHR | |
| SCHEMBL2221918 | 0.85 | ALDH1A1 (0.33) | ALDH1A1TDP1MAPK1 | |
| SCHEMBL6319583 | 0.83 | TSHR (0.44) | ALDH1A1TDP1L3MBTL1CYP3A4TSHR | |
| SCHEMBL16651566 | 0.83 | TSHR (0.50) | ALDH1A1TDP1L3MBTL1CYP3A4TSHR | |
| SCHEMBL2689920 | 0.83 | TSHR (0.50) | ALDH1A1TDP1L3MBTL1CYP3A4TSHR | |
| SCHEMBL3004576 | 0.82 | ALDH1A1 (0.42) | ALDH1A1 | |
| SCHEMBL189711 | 0.81 | ALDH1A1 (0.50) | ALDH1A1TDP1L3MBTL1TSHRMAPK1 | |
| SCHEMBL15511028 | 0.80 | TSHR (0.47) | ALDH1A1TSHRCTSLCTSSCTSK | |
| SCHEMBL1228085 | 0.79 | ALDH1A1 (0.43) | ALDH1A1TDP1L3MBTL1MAPK1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9964848-B2 | Positive photosensitive resin composition and cured film forming method using the same | FUJIFILM CORPORATION (JP) | 2018-05-08 | — | — | US | disclosed |
| US-20150212406-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-07-30 | — | — | US | disclosed |
| US-9034440-B2 | Positive photosensitive resin composition and cured film forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-8771907-B2 | Positive photosensitive resin composition and method of forming cured film from the same | FUJIFILM CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| EP-2447774-B1 | Positive photosensitive resin composition and method of forming cured film from the same | FUJIFILM CORP (JP) | 2014-02-26 | — | — | EP | disclosed |
| EP-2557456-A2 | Positive photosensitive resin composition and method of forming cured film from the same | Fujifilm Corporation (JP) | 2013-02-13 | — | — | EP | disclosed |
| EP-2447774-A1 | Positive photosensitive resin composition and method of forming cured film from the same | Fujifilm Corporation (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20110229661-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME | C/O FUJIFILM CORPORATION (JP) | 2011-09-22 | — | — | US | disclosed |
| US-20110177302-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME | FUJIFILM CORPORATION (JP) | 2011-07-21 | — | — | US | disclosed |
| EP-2261737-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME | FUJIFILM Corporation (JP) | 2010-12-15 | — | — | EP | disclosed |
| EP-2196852-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMATION OF CURED FILM USING THE SAME | Fujifilm Corporation (JP) | 2010-06-16 | — | — | EP | disclosed |