Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | MGLL | Q99685 | 6/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2221235 | 0.82 | ALDH1A1 (0.47) | ALDH1A1MGLL | |
| SCHEMBL3062591 | 0.81 | ALDH1A1 (0.58) | ALDH1A1MGLL | |
| SCHEMBL28216920 | 0.81 | ALDH1A1 (0.63) | ALDH1A1MGLLTSHR | |
| SCHEMBL2220918 | 0.80 | ALDH1A1 (0.51) | ALDH1A1MGLL | |
| SCHEMBL2218607 | 0.80 | ALDH1A1 (0.36) | ALDH1A1TSHR | |
| SCHEMBL3047393 | 0.79 | ALDH1A1 (0.50) | ALDH1A1MGLLTSHR | |
| SCHEMBL1395905 | 0.77 | ALDH1A1 (0.46) | ALDH1A1TSHR | |
| SCHEMBL31144810 | 0.77 | ALDH1A1 (0.66) | ALDH1A1MGLLTSHR | |
| Acrylic Acid Ethyl Ester SCHEMBL11217002 | 0.77 | ALDH1A1 (0.57) | ALDH1A1MGLLTSHR | |
| SCHEMBL16442918 | 0.76 | ALDH1A1 (0.68) | ALDH1A1MGLLTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8932800-B2 | Positive photosensitive resin composition and method for forming cured film using the same | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8771907-B2 | Positive photosensitive resin composition and method of forming cured film from the same | FUJIFILM CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| EP-2447774-B1 | Positive photosensitive resin composition and method of forming cured film from the same | FUJIFILM CORP (JP) | 2014-02-26 | — | — | EP | disclosed |
| US-20130071787-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING CURED FILM USING THE SAME | FUJIFILM CORPORATION (KP) | 2013-03-21 | — | — | US | disclosed |
| EP-2557456-A2 | Positive photosensitive resin composition and method of forming cured film from the same | Fujifilm Corporation (JP) | 2013-02-13 | — | — | EP | disclosed |
| US-8329380-B2 | Positive photosensitive resin composition and method for forming cured film using the same | FUJIFILM CORPORATION (JP) | 2012-12-11 | — | — | US | disclosed |
| EP-2447774-A1 | Positive photosensitive resin composition and method of forming cured film from the same | Fujifilm Corporation (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20110177302-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME | FUJIFILM CORPORATION (JP) | 2011-07-21 | — | — | US | disclosed |
| EP-2261737-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME | FUJIFILM Corporation (JP) | 2010-12-15 | — | — | EP | disclosed |
| US-20100173246-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING CURED FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-08 | — | — | US | disclosed |
| EP-2154571-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM THEREFROM | Fujifilm Corporation (JP) | 2010-02-17 | — | — | EP | disclosed |