SCHEMBL2223328

SCHEMBL2223328

CCCCOC(CC)CC(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.42
MAPK1 P28482 4/20 0.41
GMNN O75496 3/20 0.41
LMNA P02545 3/20 0.41
MAPT P10636 3/20 0.41
NPSR1 Q6W5P4 3/20 0.41
MEN1 O00255 2/20 0.41
HSP90AA1 P07900 2/20 0.41
BLM P54132 2/20 0.41
KMT2A Q03164 2/20 0.41
NR1H4 Q96RI1 2/20 0.41
TP53 P04637 1/20 0.41
CYP2C9 P11712 1/20 0.41
TSHR P16473 1/20 0.41
HIF1A Q16665 1/20 0.41
GPR84 Q9NQS5 4/20 0.41
GLA P06280 1/20 0.41
PMP22 Q01453 1/20 0.41
ALDH1A1 P00352 1/20 0.39
S1PR1 P21453 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28896925 0.92 DNM1 (0.48) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL498556 0.88 CYP1A2 (0.38) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL28380343 0.86 ALDH1A1 (0.45) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL14815623 0.86 GPR84 (0.44) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL538789 0.86 GPR84 (0.44) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL8090207 0.86 LPAR1 (0.50) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL13937126 0.85 GPR84 (0.52) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL8982869 0.83 GPR84 (0.55) CYP1A2MAPK1GMNNLMNAMAPT
SCHEMBL6914851 0.83 LPAR1 (0.47) TSHRALDH1A1
SCHEMBL12990316 0.83 GPR84 (0.55) CYP1A2MAPK1GMNNLMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070020558-A1 Process for the preparation of a photoresist solution ZAHN WOLFGANG 2007-01-25 US claimed
EP-2521745-B1 SOLVENT BORNE TWO-COMPONENT POLYURETHANE COATING COMPOSITION AKZO NOBEL COATINGS INT BV (NL) 2015-08-05 EP disclosed
EP-2521745-A2 SOLVENT BORNE TWO-COMPONENT POLYURETHANE COATING COMPOSITION Akzo Nobel Coatings International B.V. (NL) 2012-11-14 EP disclosed
US-20120282834-A1 SOLVENT BORNE TWO-COMPONENT POLYURETHANE COATING COMPOSTION AKZO NOBEL COATING INTERNATIONAL B.V. (NL) 2012-11-08 US disclosed
WO-2011083109-A2 SOLVENT BORNE TWO-COMPONENT POLYURETHANE COATING COMPOSITION AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) 2011-07-14 WO disclosed
US-20070020558-A1 Process for the preparation of a photoresist solution ZAHN WOLFGANG 2007-01-25 US disclosed
US-20050042536-A1 Photosensitive resin composition comprising quinonediazide sulfate ester compound DONGJIN SEMICHEM CO. LTD. (KR) 2005-02-24 US disclosed
WO-2003036388-A1 PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND DONGJIN SEMICHEM CO., LTD. (KR) 2003-05-01 WO disclosed
EP-0978545-A1 Solvents for polyurethane coatings Finch, Stephen (GB) 2000-02-09 EP disclosed