Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR119 | Q8TDV5 | 10/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | USP30 | Q70CQ3 | 1/20 | 0.37 |
| ▸ | PDE4A | P27815 | 2/20 | 0.37 |
| ▸ | PDE4B | Q07343 | 2/20 | 0.37 |
| ▸ | PDE4C | Q08493 | 2/20 | 0.37 |
| ▸ | PDE4D | Q08499 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22277387 | 0.88 | GPR119 (0.49) | GPR119KMT2AKDM4EPKMUSP30 | |
| SCHEMBL22277413 | 0.87 | KDM4E (0.39) | GPR119KMT2AKDM4EPKMPDE4A | |
| SCHEMBL22277395 | 0.82 | GPR119 (0.39) | GPR119KMT2AKDM4EPKMMEN1 | |
| SCHEMBL22277398 | 0.82 | GPR119 (0.34) | GPR119KDM4EPKM | |
| SCHEMBL24179407 | 0.81 | DPP4 (0.35) | GPR119KDM4EPKMPDE4APDE4B | |
| SCHEMBL23871079 | 0.77 | HPGD (0.36) | GPR119KDM4EPKM | |
| SCHEMBL26785274 | 0.77 | RECQL (0.37) | GPR119KDM4EPKM | |
| SCHEMBL23871072 | 0.77 | HPGD (0.36) | GPR119KDM4EPKM | |
| SCHEMBL26791099 | 0.77 | HPGD (0.36) | GPR119KDM4EPKM | |
| SCHEMBL23870681 | 0.76 | GAA (0.35) | GPR119KDM4EPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20200241417-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |