SCHEMBL22277387

SCHEMBL22277387

CC(C)(C)OC(=O)N1CCC(C(C)(C)OC(=O)c2ccc(I)cc2)CC1

nearest known ligand 0.49

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
GPR119 Q8TDV5 10/20 0.49
KMT2A Q03164 2/20 0.47
PTPN2 P17706 1/20 0.45
PTPN1 P18031 1/20 0.45
PTPN6 P29350 1/20 0.45
ABL1 P00519 1/20 0.45
RIN1 Q13671 1/20 0.45
KDM4E B2RXH2 1/20 0.45
PKM P14618 1/20 0.45
USP30 Q70CQ3 1/20 0.44
ALDH1A1 P00352 1/20 0.44
MEN1 O00255 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22277396 0.88 GPR119 (0.38) GPR119KMT2AKDM4EPKMUSP30
SCHEMBL22277407 0.86 MEN1 (0.47) GPR119KMT2APTPN2PTPN1PTPN6
SCHEMBL22277386 0.81 GPR119 (0.50) GPR119KMT2APTPN2PTPN1PTPN6
SCHEMBL22277391 0.81 GPR119 (0.44) GPR119KMT2APTPN2PTPN1PTPN6
SCHEMBL22277450 0.79 MAPT (0.42) GPR119KMT2APTPN2PTPN1PTPN6
SCHEMBL22277481 0.78 MAPT (0.41) GPR119KMT2APTPN2PTPN1PTPN6
SCHEMBL22277453 0.78 PTPN2 (0.40) KMT2APTPN2PTPN1MEN1
SCHEMBL18788903 0.78 NAMPT (0.60) GPR119PTPN2PTPN1PTPN6KDM4E
SCHEMBL25401822 0.78 HDAC4 (0.60) GPR119KMT2AKDM4EPKMUSP30
SCHEMBL2365799 0.77 KMT2A (0.68) GPR119KMT2AABL1RIN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200241417-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed