SCHEMBL22277398

SCHEMBL22277398

CCC(C)(C)OC(=O)N1CCC(C(C)(C)OC(=O)c2c(I)ccc(I)c2I)CC1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GPR119 Q8TDV5 8/20 0.34
PTPN2 P17706 1/20 0.34
PTPN1 P18031 1/20 0.34
PTPN6 P29350 1/20 0.34
KDM4E B2RXH2 1/20 0.34
PKM P14618 1/20 0.34
TP53 P04637 1/20 0.33
ALDH1A1 P00352 2/20 0.33
NPY2R P49146 1/20 0.33
DPP4 P27487 1/20 0.32
STS P08842 1/20 0.32
NPC1 O15118 1/20 0.32
MAPT P10636 1/20 0.32
MAPK1 P28482 1/20 0.32
HTT P42858 1/20 0.32
RAB9A P51151 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22277391 0.89 GPR119 (0.44) GPR119PTPN2PTPN1PTPN6KDM4E
SCHEMBL21705236 0.83 GPR119 (0.40) GPR119KDM4EPKM
SCHEMBL22277395 0.83 GPR119 (0.39) GPR119PTPN2PTPN1KDM4EPKM
SCHEMBL22277396 0.82 GPR119 (0.38) GPR119KDM4EPKM
SCHEMBL22277410 0.82 LMNA (0.37) GPR119KDM4EPKMMAPK1RAB9A
SCHEMBL22277405 0.81 SMN1; SMN2 (0.51) NPC1HTTRAB9A
SCHEMBL24179407 0.81 DPP4 (0.35) GPR119PTPN2PTPN1PTPN6KDM4E
SCHEMBL22277416 0.79 L3MBTL1 (0.37) GPR119KDM4EALDH1A1MAPTL3MBTL1
SCHEMBL22277413 0.79 KDM4E (0.39) GPR119KDM4EPKMTP53NPY2R
SCHEMBL23871072 0.75 HPGD (0.36) GPR119PTPN2PTPN1PTPN6KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200241417-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed
US-20200241414-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200241414-A1 RESIST COMPOSITION AND PATTERNING PROCESS INSR, HNRNPU, HNRNPR GPR119 191/4885PTPN2 1561/4885PTPN1 1451/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.