SCHEMBL2228819

SCHEMBL2228819

c1ccc2c(-c3nncc4ccccc34)cccc2c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.47
ALDH1A1 P00352 2/20 0.47
MAPT P10636 2/20 0.47
HPGD P15428 1/20 0.47
KDM4E B2RXH2 2/20 0.46
TP53 P04637 2/20 0.46
CYP3A4 P08684 2/20 0.46
GOT1 P17174 2/20 0.46
NPC1 O15118 1/20 0.46
LMNA P02545 1/20 0.46
MPO P05164 1/20 0.46
CYP1A2 P05177 1/20 0.46
CYP2D6 P10635 1/20 0.46
PKM P14618 1/20 0.46
MAOA P21397 1/20 0.46
PTGS1 P23219 1/20 0.46
THPO P40225 1/20 0.46
RAB9A P51151 1/20 0.46
AOX1 Q06278 1/20 0.46
ACOX1 Q15067 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30632058 1.00 SMN1; SMN2 (0.47) SMN1; SMN2ALDH1A1MAPTHPGDKDM4E
SCHEMBL30523852 0.83 KDM4E (0.55) SMN1; SMN2ALDH1A1MAPTKDM4ETP53
SCHEMBL1673296 0.83 KDM4E (0.55) SMN1; SMN2ALDH1A1MAPTKDM4ETP53
SCHEMBL28988478 0.81 KDM4E (0.43) SMN1; SMN2ALDH1A1MAPTHPGDKDM4E
SCHEMBL6614659 0.81 ADORA2A (0.49) SMN1; SMN2ALDH1A1MAPTHPGDKDM4E
SCHEMBL28805792 0.81 ALDH1A1 (0.43) SMN1; SMN2ALDH1A1MAPTHPGDKDM4E
SCHEMBL29941671 0.81 MAPK14 (0.48) SMN1; SMN2ALDH1A1MAPTKDM4ETP53
SCHEMBL5318547 0.81 KDR (0.46) SMN1; SMN2ALDH1A1MAPTHPGDKDR
SCHEMBL27517833 0.81 KDR (0.48) SMN1; SMN2ALDH1A1MAPTHPGDKDM4E
SCHEMBL28877297 0.80 TNF (0.41) SMN1; SMN2ALDH1A1MAPTHPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 651 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6783927-B2 CONTAINING SURFACTANT FUJI PHOTO FILM, CO., LTD. (JP) 2004-08-31 US claimed
US-6423486-B1 None US disclosed
CN-110579936-B Thermally developable photosensitive material and medical film using the same 柯尼卡美能达株式会社 2023-10-27 CN disclosed
CN-110579936-A Heat-developable photosensitive material and medical film using the same 柯尼卡美能达株式会社 2019-12-17 CN disclosed
CN-107073901-A Laminated safety glass 爱克发印艺公司 2017-08-18 CN disclosed
CN-107001828-A Radiation curable compositions 爱克发印艺公司 2017-08-01 CN disclosed
EP-1072948-B1 Thermally processed image recording material FUJIFILM CORP (JP) 2017-07-05 EP disclosed
US-7977040-B2 Sharp images; medical diagnosis; mixture of photosensitive silver halide emulsion, organic silver salt, reducing agents and binder on support FUJIFILM CORPORATION (JP) 2011-07-12 US disclosed
EP-1637924-B1 Image forming method using photothermographic material FUJIFILM CORP (JP) 2010-07-21 EP disclosed
CN-1707357-B Photothermographic material and image forming method FUJI PHOTO FILM CO LTD 2010-04-21 CN disclosed
EP-0838722-A2 Photothermographic material, novel 2,3-dihydrothiazole derivative, and photographic silver halide photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 1998-04-29 EP disclosed
EP-0834767-A1 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 1998-04-08 EP disclosed
EP-0829753-A1 Photographic silver halide photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 1998-03-18 EP disclosed
CN-1171846-A Hydrazide compounds useful as co-developers for black-and -white photothermographic elements IMATION CORP (US) 1998-01-28 CN disclosed
CN-1168482-A Photothermographic material and method for making FUJI PHOTO FILM CO LTD (JP) 1997-12-24 CN disclosed
EP-0805376-A2 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 1997-11-05 EP disclosed
CN-1164282-A Photothermographic material having high interlayer adhesion IMATION CORP (US) 1997-11-05 CN disclosed
CN-1164283-A Photothermographic element with reduced wood grain interference pattern IMATION CORP (US) 1997-11-05 CN disclosed
EP-0803764-A1 Photothermographic material and method for making FUJI PHOTO FILM CO., LTD. (JP) 1997-10-29 EP disclosed
CN-1155678-A Heat-developable light-sensitive material FUJI PHOTO FILM CO LTD (JP) 1997-07-30 CN disclosed