SCHEMBL22357192

SCHEMBL22357192

CC(C)(C)c1cc(C(=O)OCC2CO2)cc(C(=O)OCC2CO2)c1

nearest known ligand 0.51

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
TP53 P04637 3/20 0.39
MAPT P10636 2/20 0.39
HPGD P15428 2/20 0.39
TSHR P16473 2/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
CYP1A2 P05177 1/20 0.39
PPARG P37231 1/20 0.39
HIF1A Q16665 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CYP3A4 P08684 1/20 0.38
MGLL Q99685 2/20 0.37
SERPINE1 P05121 1/20 0.36
NPC1 O15118 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6951367 0.87 ALDH1A1 (0.47) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL3240666 0.85 MAPT (0.45) ALDH1A1TP53MAPTHPGDTSHR
SCHEMBL22357190 0.83 ALDH1A1 (0.45) ALDH1A1TP53TDP1CYP3A4MGLL
SCHEMBL28073407 0.81 MGLL (0.43) ALDH1A1TP53CYP3A4MGLL
SCHEMBL19647689 0.80 TSHR (0.44) ALDH1A1TP53MAPTTSHRCYP3A4
SCHEMBL22357195 0.80 KMT2A (0.46) ALDH1A1TP53MAPTHPGDMEN1
SCHEMBL19628366 0.80 LMNA (0.47) ALDH1A1HPGDTSHRTDP1NPC1
SCHEMBL26425111 0.80 KMT2A (0.46) ALDH1A1TP53MAPTHPGDMEN1
SCHEMBL19628365 0.80 TP53 (0.45) ALDH1A1TP53CYP3A4MGLL
SCHEMBL16273358 0.80 ALDH1A1 (0.45) ALDH1A1TP53MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023238920-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT 日産化学株式会社 2023-12-14 WO disclosed
WO-2023182408-A1 COMPOSITION FOR FORMING RESIST-LOWER-LAYER FILM INCLUDING FLUORENE SKELETON 日産化学株式会社 2023-09-28 WO disclosed
WO-2023181960-A1 COMPOSITION FOR FORMING PROTECTIVE FILM 日産化学株式会社 2023-09-28 WO disclosed
WO-2023149327-A1 PROTECTIVE FILM FORMING COMPOSITION 日産化学株式会社 2023-08-10 WO disclosed
US-20220404706-A1 CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE FILM NISSAN CHEMICAL CORPORATION (JP) 2022-12-22 US disclosed
US-20220153920-A1 METHOD FOR PRODUCING POLYMER NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
US-20220145119-A1 CHEMICAL SOLUTION-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT HAVING DIOL STRUCTURE AT TERMINAL THEREOF NISSAN CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-20210403635-A1 CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT OF ARYLENE COMPOUND HAVING GLYCIDYL GROUP NISSAN CHEMICAL CORPORATION (JP) 2021-12-30 US disclosed
WO-2021085397-A1 CHEMICAL-RESISTANT POLYCARBOXYLIC ACID-CONTAINING PROTECTIVE FILM 日産化学株式会社 2021-05-06 WO disclosed
WO-2020166580-A1 METHOD FOR PRODUCING POLYMER 日産化学株式会社 2020-08-20 WO disclosed