SCHEMBL22372811

SCHEMBL22372811

CC(=O)c1ccc(C(=O)OC(C)(C)C2CCNCC2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.38
KMT2A Q03164 4/20 0.38
CYP2D6 P10635 2/20 0.38
GPR119 Q8TDV5 1/20 0.38
ALDH1A1 P00352 2/20 0.38
MAPT P10636 2/20 0.37
OPRD1 P41143 1/20 0.36
RAB9A P51151 2/20 0.36
HPGD P15428 1/20 0.36
SMYD3 Q9H7B4 1/20 0.35
NPC1 O15118 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
LMNA P02545 2/20 0.35
ADAM17 P78536 1/20 0.35
HTT P42858 1/20 0.35
HRH1 P35367 1/20 0.34
SCN1A P35498 1/20 0.34
SCN2A Q99250 1/20 0.34
SCN3A Q9NY46 1/20 0.34
KDM1A O60341 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373044 0.94 MEN1 (0.41) MEN1KMT2ACYP2D6ALDH1A1MAPT
SCHEMBL22373194 0.88 CA12 (0.42) MEN1KMT2ACYP2D6ALDH1A1MAPT
SCHEMBL22373124 0.88 KMT2A (0.51) MEN1KMT2ACYP2D6ALDH1A1MAPT
SCHEMBL26478419 0.88 SMN1; SMN2 (0.40) MEN1KMT2ACYP2D6ALDH1A1MAPT
SCHEMBL22372848 0.87 HPGD (0.47) MEN1KMT2ACYP2D6ALDH1A1MAPT
SCHEMBL22372936 0.87 LMNA (0.41) MEN1KMT2ACYP2D6ALDH1A1MAPT
SCHEMBL22372809 0.87 GPR119 (0.39) MEN1KMT2ACYP2D6GPR119ALDH1A1
SCHEMBL22373063 0.87 ALDH1A1 (0.40) MEN1KMT2ACYP2D6ALDH1A1LMNA
SCHEMBL22277453 0.87 PTPN2 (0.40) MEN1KMT2ACYP2D6MAPT
SCHEMBL22373139 0.87 MEN1 (0.37) MEN1KMT2ACYP2D6ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200272049-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR MEN1 3578/4885KMT2A 1033/4885CYP2D6 4099/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.