SCHEMBL22373228

SCHEMBL22373228

Cc1ccc(CCC(=O)OC(C)(C)C2CCNCC2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ITGB3 P05106 1/20 0.41
▸ ITGA2B P08514 1/20 0.41
▸ MEN1 O00255 1/20 0.40
▸ CYP2D6 P10635 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ L3MBTL1 Q9Y468 4/20 0.38
▸ LMNA P02545 2/20 0.38
▸ MAPT P10636 2/20 0.38
▸ CYP4F2 P78329 1/20 0.38
▸ CYP4A11 Q02928 1/20 0.38
▸ ALDH1A1 P00352 3/20 0.37
▸ TDP1 Q9NUW8 2/20 0.37
▸ FFAR1 O14842 2/20 0.37
▸ KDM4E B2RXH2 1/20 0.36
▸ AKR1C3 P42330 2/20 0.35
▸ NPC1 O15118 1/20 0.35
▸ RAB9A P51151 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ SLC5A1 P13866 1/20 0.35
▸ SLC5A2 P31639 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22372884 0.93 ITGB3 (0.40) ITGB3ITGA2BMEN1CYP2D6KMT2A
SCHEMBL22372823 0.90 ITGB3 (0.41) ITGB3ITGA2BMEN1CYP2D6KMT2A
SCHEMBL22373222 0.89 ITGB3 (0.40) ITGB3ITGA2BCYP4F2CYP4A11ALDH1A1
SCHEMBL26477939 0.89 ITGB3 (0.40) ITGB3ITGA2BMEN1KMT2ALMNA
SCHEMBL22372859 0.87 KMT2A (0.41) MEN1CYP2D6KMT2AALDH1A1NPC1
SCHEMBL26412685 0.84 KCNJ1 (0.43) ITGB3ITGA2BL3MBTL1LMNAMAPT
SCHEMBL22372975 0.84 KMT2A (0.45) MEN1CYP2D6KMT2ALMNAMAPT
SCHEMBL22373091 0.82 MEN1 (0.47) MEN1KMT2A
SCHEMBL26478075 0.81 ITGB3 (0.39) ITGB3ITGA2BMEN1CYP2D6KMT2A
SCHEMBL22373000 0.81 ADRB2 (0.43) ITGB3ITGA2BMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 — — US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20200272049-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ITGB3 1448/4885ITGA2B 2716/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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