SCHEMBL22373000

SCHEMBL22373000

CC(C)(OC(=O)CCCc1ccccc1)C1CCNCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.43
ADRB1 P08588 1/20 0.43
ADRB3 P13945 1/20 0.43
ALOX5 P09917 1/20 0.43
HDAC3 O15379 2/20 0.42
HDAC4 P56524 2/20 0.42
HDAC1 Q13547 2/20 0.42
HDAC7 Q8WUI4 2/20 0.42
HDAC2 Q92769 2/20 0.42
HDAC10 Q969S8 2/20 0.42
HDAC11 Q96DB2 2/20 0.42
HDAC8 Q9BY41 2/20 0.42
HDAC6 Q9UBN7 2/20 0.42
HDAC9 Q9UKV0 2/20 0.42
HDAC5 Q9UQL6 2/20 0.42
MAPK1 P28482 1/20 0.42
ADRA1A P35348 1/20 0.42
SLC6A3 Q01959 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
FAAH O00519 4/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22374186 0.96 MAPT (0.42) ADRB2ADRB1ADRB3ALOX5FAAH
SCHEMBL22374195 0.95 MAPT (0.44) ALOX5HDAC1HDAC2FAAHITGB3
SCHEMBL22372884 0.89 ITGB3 (0.40) ALOX5TDP1KMT2AITGB3ITGA2B
SCHEMBL26478075 0.88 ITGB3 (0.39) SMN1; SMN2TDP1KMT2AEPHX2ITGB3
SCHEMBL22373155 0.87 CYP1A2 (0.47) ALOX5SMN1; SMN2KMT2AITGB3ITGA2B
SCHEMBL26412465 0.84 HRH1 (0.42) ADRB2ADRB1ADRB3MAPK1SMN1; SMN2
SCHEMBL22373134 0.84 L3MBTL1 (0.45) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL22373176 0.84 ITGB3 (0.45) SMN1; SMN2TDP1KMT2AITGB3ITGA2B
SCHEMBL22373135 0.84 LMNA (0.42) ADRB1ADRB3HDAC3HDAC4HDAC1
SCHEMBL22373191 0.82 ITGB3 (0.40) TDP1KMT2AITGB3ITGA2BMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200272049-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ADRB2 2558/4885ADRB1 3137/4885ADRB3 2695/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.