SCHEMBL22373369

SCHEMBL22373369

COc1ccccc1C(=O)OC(C)(C)C1CCNCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.45
NPSR1 Q6W5P4 1/20 0.45
HTR2C P28335 2/20 0.44
CDK1 P06493 1/20 0.43
CDK4 P11802 1/20 0.43
CCND1 P24385 1/20 0.43
CDK2 P24941 1/20 0.43
ATM Q13315 1/20 0.43
BRPF1 P55201 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
HPGD P15428 2/20 0.41
ALDH1A1 P00352 1/20 0.41
PIN1 Q13526 1/20 0.40
CHRM2 P08172 1/20 0.40
CHRM4 P08173 1/20 0.40
CHRM5 P08912 1/20 0.40
CHRM1 P11229 1/20 0.40
CHRM3 P20309 1/20 0.40
ABCG2 Q9UNQ0 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373529 0.89 CYP2D6 (0.42) HTR2CMEN1KMT2AALDH1A1
SCHEMBL22373224 0.89 HTR2C (0.39) HTR2CCDK1CDK4CCND1CDK2
SCHEMBL22373414 0.89 KMT2A (0.43) MAPTHTR2CMEN1KMT2AHPGD
SCHEMBL22373157 0.89 TAS1R3 (0.44) MAPTHTR2CCDK1CDK4CCND1
SCHEMBL22374183 0.86 SLC6A2 (0.52) MAPTNPSR1ALDH1A1
SCHEMBL22373406 0.86 SLC6A2 (0.48) NPSR1HTR2CMEN1KMT2AESR1
SCHEMBL22372842 0.85 HTR2C (0.42) MAPTHTR2CCDK2
SCHEMBL22373496 0.85 ALDH1A1 (0.48) MAPTATMMEN1KMT2AHPGD
SCHEMBL26412476 0.85 KMT2A (0.40) MAPTNPSR1HTR2CCDK1CDK4
SCHEMBL22373123 0.84 HTR2C (0.40) HTR2CMEN1KMT2AALDH1A1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200272049-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR MAPT 2648/4885NPSR1 2668/4885HTR2C 3398/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.