SCHEMBL22374183

SCHEMBL22374183

CC(C)(OC(=O)c1ccccc1Oc1ccccc1)C1CCNCC1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 11/20 0.52
SLC6A4 P31645 11/20 0.52
KCNH2 Q12809 6/20 0.52
SLC6A3 Q01959 7/20 0.51
CYP2D6 P10635 4/20 0.51
SCN1A P35498 1/20 0.50
SCN2A Q99250 1/20 0.50
SCN3A Q9NY46 1/20 0.50
MAPT P10636 1/20 0.46
HTT P42858 1/20 0.46
HTR1A P08908 3/20 0.46
KDM4E B2RXH2 1/20 0.46
CTNNB1 P35222 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
ALDH1A1 P00352 1/20 0.42
GAA P10253 1/20 0.42
TSHR P16473 1/20 0.42
TPSAB1 Q15661 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373369 0.86 MAPT (0.45) MAPTNPSR1ALDH1A1
SCHEMBL22373529 0.86 CYP2D6 (0.42) SLC6A2SLC6A4KCNH2SLC6A3CYP2D6
SCHEMBL22373178 0.83 MRGPRX1 (0.42) SLC6A2SLC6A4KCNH2SLC6A3MAPT
SCHEMBL22373406 0.83 SLC6A2 (0.48) SLC6A2SLC6A4SLC6A3KDM4ENPSR1
SCHEMBL22374191 0.82 CHRNB2 (0.42) SLC6A2SLC6A4SLC6A3CYP2D6SCN1A
SCHEMBL22374187 0.82 CHRNB2 (0.48) SLC6A2SLC6A4KCNH2SLC6A3CYP2D6
SCHEMBL22373190 0.81 LMNA (0.45) CYP2D6SCN1ASCN2ASCN3AMAPT
SCHEMBL22372815 0.81 CYP2D6 (0.39) SLC6A2SLC6A4KCNH2SLC6A3CYP2D6
SCHEMBL22373064 0.81 RXFP1 (0.44) SLC6A2SLC6A4KCNH2SLC6A3CYP2D6
SCHEMBL22373123 0.81 HTR2C (0.40) SLC6A2SLC6A4SLC6A3CYP2D6SCN1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SLC6A2 2338/4885SLC6A4 2893/4885KCNH2 565/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.