SCHEMBL22373531

SCHEMBL22373531

CC(C)(OC(=O)c1cccc(C(=O)OC(C)(C)C2CCNCC2)c1)C1CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ITGB3 P05106 1/20 0.40
ITGA2B P08514 1/20 0.40
MEN1 O00255 2/20 0.38
CYP2D6 P10635 2/20 0.38
KMT2A Q03164 2/20 0.38
LMNA P02545 1/20 0.37
HRH1 P35367 1/20 0.37
SCN1A P35498 1/20 0.37
SCN2A Q99250 1/20 0.37
SCN3A Q9NY46 1/20 0.37
SLC7A5 Q01650 1/20 0.36
SLC6A4 P31645 2/20 0.35
SLC6A2 P23975 1/20 0.35
SLC6A3 Q01959 1/20 0.35
ROCK2 O75116 1/20 0.35
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TYRO3 Q06418 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22372743 0.95 FYN (0.39) ITGB3ITGA2BMEN1CYP2D6KMT2A
SCHEMBL22373188 0.92 P4HB (0.42)
SCHEMBL22373108 0.92 HTR2C (0.42) MEN1CYP2D6KMT2A
SCHEMBL22372847 0.91 MEN1 (0.38) ITGB3ITGA2BMEN1CYP2D6KMT2A
SCHEMBL22277445 0.91 TP53BP1 (0.36) ITGB3ITGA2BMEN1CYP2D6KMT2A
SCHEMBL22374236 0.91 SLC6A2 (0.43) KMT2AHRH1SLC6A4SLC6A2SLC6A3
SCHEMBL26477547 0.91 PTPN1 (0.41) MEN1KMT2ALMNAALDH1A1TSHR
SCHEMBL22372789 0.90 TSHR (0.46) MEN1CYP2D6KMT2ALMNAHRH1
SCHEMBL22373412 0.90 KDM4E (0.44) KMT2ALMNAALDH1A1TSHRHSD17B10
SCHEMBL22373035 0.90 CYP1A2 (0.41) ITGB3ITGA2BMEN1CYP2D6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200272049-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ITGB3 1448/4885ITGA2B 2716/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.