SCHEMBL22374236

SCHEMBL22374236

CC(C)(OC(=O)c1cccc(Cl)c1)C1CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 3/20 0.43
SLC6A4 P31645 3/20 0.43
SLC6A3 Q01959 3/20 0.43
L3MBTL1 Q9Y468 3/20 0.43
TSHR P16473 1/20 0.42
RXFP1 Q9HBX9 1/20 0.42
KDM4E B2RXH2 2/20 0.40
ALDH1A1 P00352 1/20 0.40
MAPT P10636 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
GAA P10253 1/20 0.40
KMT2A Q03164 1/20 0.40
KCNH2 Q12809 2/20 0.39
CACNA1I Q9P0X4 1/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
CHRNA1 P02708 1/20 0.39
CHRNG P07510 1/20 0.39
ITGA5 P08648 1/20 0.39
CHRNB1 P11230 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373531 0.91 ITGB3 (0.40) SLC6A2SLC6A4SLC6A3TSHRALDH1A1
SCHEMBL22372910 0.87 CYP2D6 (0.41) SLC6A2SLC6A4SLC6A3TSHRGAA
SCHEMBL22373188 0.86 P4HB (0.42) KDM4ENPC1RAB9A
SCHEMBL22372743 0.86 FYN (0.39) ALDH1A1MAPTSMN1; SMN2KMT2ANPC1
SCHEMBL22373108 0.86 HTR2C (0.42) MAPTSMN1; SMN2KMT2ANPC1RAB9A
SCHEMBL26477547 0.85 PTPN1 (0.41) TSHRKDM4EALDH1A1SMN1; SMN2GAA
SCHEMBL22277445 0.85 TP53BP1 (0.36) SLC6A2SLC6A4SLC6A3KMT2AHRH1
SCHEMBL22373063 0.84 ALDH1A1 (0.40) SLC6A2SLC6A4SLC6A3L3MBTL1ALDH1A1
SCHEMBL22372789 0.84 TSHR (0.46) SLC6A2SLC6A4SLC6A3L3MBTL1TSHR
SCHEMBL22373412 0.84 KDM4E (0.44) L3MBTL1TSHRKDM4EALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SLC6A2 2338/4885SLC6A4 2893/4885SLC6A3 1449/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.