SCHEMBL22277445

SCHEMBL22277445

CC(C)(OC(=O)c1cccc(I)c1)C1CCNCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53BP1 Q12888 1/20 0.36
SLC6A3 Q01959 2/20 0.35
UBE2D3 P61077 1/20 0.34
MEN1 O00255 2/20 0.34
CYP2D6 P10635 2/20 0.34
KMT2A Q03164 2/20 0.34
MGLL Q99685 1/20 0.34
ITGB3 P05106 1/20 0.34
ITGA2B P08514 1/20 0.34
LMNA P02545 1/20 0.33
HRH1 P35367 1/20 0.33
SCN1A P35498 1/20 0.33
SCN2A Q99250 1/20 0.33
SCN3A Q9NY46 1/20 0.33
SLC7A5 Q01650 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373531 0.91 ITGB3 (0.40) SLC6A3MEN1CYP2D6KMT2AITGB3
SCHEMBL22277389 0.87 MEN1 (0.34) MEN1CYP2D6KMT2ALMNAHRH1
SCHEMBL22372743 0.86 FYN (0.39) MEN1CYP2D6KMT2AITGB3ITGA2B
SCHEMBL22373188 0.86 P4HB (0.42) MGLL
SCHEMBL22373108 0.86 HTR2C (0.42) MEN1CYP2D6KMT2A
SCHEMBL22277409 0.85 KMT2A (0.35) TP53BP1SLC6A3UBE2D3KMT2A
SCHEMBL22374236 0.85 SLC6A2 (0.43) SLC6A3KMT2AHRH1SLC6A2SLC6A4
SCHEMBL26477547 0.85 PTPN1 (0.41) MEN1KMT2ALMNA
SCHEMBL22277453 0.84 PTPN2 (0.40) SLC6A3MEN1CYP2D6KMT2ASLC6A4
SCHEMBL22372789 0.84 TSHR (0.46) SLC6A3MEN1CYP2D6KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200241417-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed