SCHEMBL22374246

SCHEMBL22374246

CC(C)(Br)C(=O)Oc1ccc(C(=O)O)c2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 2/20 0.50
HPGDS O60760 1/20 0.44
PLK1 P53350 1/20 0.42
ELANE P08246 3/20 0.41
HPGD P15428 5/20 0.41
KMT2A Q03164 1/20 0.41
PKM P14618 1/20 0.41
CYP2C9 P11712 2/20 0.40
HIF1A Q16665 1/20 0.40
KDM4E B2RXH2 4/20 0.40
HSD17B10 Q99714 4/20 0.40
ALDH1A1 P00352 3/20 0.40
TSHR P16473 2/20 0.40
ESR1 P03372 1/20 0.40
ITGB3 P05106 1/20 0.40
ITGA2B P08514 1/20 0.40
HMGB1 P09429 1/20 0.40
GGT1 P19440 1/20 0.40
PTGS1 P23219 1/20 0.40
PTGS2 P35354 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30341823 0.88 PKM (0.49) HPGDSPLK1ELANEHPGDKMT2A
SCHEMBL22279486 0.86 CDC25B (0.49) CDC25BHPGDSPLK1ELANEHPGD
SCHEMBL14827255 0.84 CDC25B (0.47) CDC25BHPGDSPLK1ELANEHPGD
SCHEMBL10025684 0.80 KDM4E (0.62) ELANEHPGDKMT2ACYP2C9KDM4E
SCHEMBL11550091 0.80 KDM4E (0.62) CDC25BHPGDSPLK1HPGDKMT2A
SCHEMBL27822312 0.79 CDC25B (0.54) CDC25BHPGDSPLK1HPGDKMT2A
SCHEMBL25946870 0.77 CDC25B (0.49) CDC25BHPGDSPLK1HPGDKMT2A
SCHEMBL4469856 0.76 CDC25B (0.78) CDC25BHPGDSPLK1HPGDKMT2A
SCHEMBL13006088 0.76 TYMS (0.48) CDC25BHPGDSPLK1HPGDKMT2A
SCHEMBL22945082 0.76 CFD (0.39) ELANEHPGDKDM4EHSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20210033970-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-04 US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed