SCHEMBL22421708

SCHEMBL22421708

Cc1ccc(C(c2cc(C)ccc2C)c2cc(C)c(O)cc2C)c(C)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TP53 P04637 2/20 0.48
▸ TDP1 Q9NUW8 2/20 0.48
▸ LMNA P02545 4/20 0.43
▸ TRPA1 O75762 3/20 0.43
▸ CHRM1 P11229 1/20 0.43
▸ SLC6A2 P23975 1/20 0.43
▸ ADRA1A P35348 1/20 0.43
▸ HTR2B P41595 1/20 0.43
▸ ALDH1A1 P00352 5/20 0.41
▸ ALOX15 P16050 3/20 0.41
▸ HSD17B10 Q99714 3/20 0.41
▸ MAPT P10636 2/20 0.41
▸ HPGD P15428 2/20 0.41
▸ ALOX12 P18054 2/20 0.41
▸ KDM4E B2RXH2 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ CYP2D6 P10635 1/20 0.41
▸ G6PD P11413 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16812653 0.86 LMNA (0.55) TP53TDP1LMNATRPA1CHRM1
SCHEMBL16812638 0.86 TP53 (0.52) TP53TDP1LMNATRPA1CHRM1
SCHEMBL18888468 0.82 TP53 (0.40) TP53TDP1LMNATRPA1CHRM1
SCHEMBL28647603 0.81 CYP2D6 (0.52) TP53TDP1LMNATRPA1CHRM1
SCHEMBL20808843 0.81 CYP2D6 (0.52) TP53TDP1LMNATRPA1CHRM1
SCHEMBL30375047 0.80 ALDH1A1 (0.45) TP53TDP1LMNATRPA1ALDH1A1
SCHEMBL2235269 0.79 TDP1 (0.46) TP53TDP1LMNATRPA1CHRM1
SCHEMBL20808844 0.79 ALDH1A1 (0.43) TP53TDP1LMNATRPA1CHRM1
SCHEMBL16812639 0.79 MAPT (0.39) TP53TDP1LMNAALDH1A1ALOX15
SCHEMBL21775831 0.77 ALDH1A1 (0.45) TP53TDP1LMNATRPA1CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2878591-B1 RADICALLY CURABLE COMPOUND, METHOD FOR PRODUCING RADICALLY CURABLE COMPOUND, RADICALLY CURABLE COMPOSITION, CURED PRODUCT THEREOF, AND COMPOSITION FOR RESIST MATERIAL DAINIPPON INK & CHEMICALS (JP) 2020-09-16 — — EP disclosed
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