SCHEMBL21775831

SCHEMBL21775831

Cc1ccc(C(c2cc(C)c(O)cc2C)c2cc(C)c(O)cc2C)cc1

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.45
▸ G6PD P11413 2/20 0.45
▸ ALOX15 P16050 2/20 0.45
▸ HSD17B10 Q99714 2/20 0.45
▸ KDM4E B2RXH2 1/20 0.45
▸ CYP1A2 P05177 1/20 0.45
▸ CYP3A4 P08684 1/20 0.45
▸ CYP2D6 P10635 1/20 0.45
▸ MAPT P10636 1/20 0.45
▸ CYP2C9 P11712 1/20 0.45
▸ PKM P14618 1/20 0.45
▸ HPGD P15428 1/20 0.45
▸ ALOX12 P18054 1/20 0.45
▸ MAPK1 P28482 1/20 0.45
▸ CYP2C19 P33261 1/20 0.45
▸ CCR6 P51684 1/20 0.45
▸ HIF1A Q16665 1/20 0.45
▸ NPSR1 Q6W5P4 1/20 0.45
▸ TP53 P04637 1/20 0.43
▸ TDP1 Q9NUW8 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278561 0.94 CYP2D6 (0.50) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL12922960 0.89 KDM4E (0.45) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL278773 0.89 CYP1A2 (0.45) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL12415075 0.89 KDM4E (0.45) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL17570365 0.87 PTGS1 (0.55) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL13416158 0.87 CYP1A2 (0.43) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL18888468 0.87 TP53 (0.40) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL5612635 0.85 ALDH1A1 (0.45) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL13416157 0.84 ALDH1A1 (0.41) ALDH1A1G6PDALOX15HSD17B10KDM4E
SCHEMBL12005179 0.84 CYP3A4 (0.41) ALDH1A1G6PDALOX15HSD17B10KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020040161-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 — — WO disclosed
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