SCHEMBL22451771

SCHEMBL22451771

CCc1ccc(C(C)(C)O)c2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ACE2 Q9BYF1 1/20 0.50
▸ GABRA1 P14867 1/20 0.39
▸ GABRB2 P47870 1/20 0.39
▸ CNR2 P34972 4/20 0.36
▸ ALDH1A1 P00352 2/20 0.34
▸ MEN1 O00255 2/20 0.34
▸ KMT2A Q03164 2/20 0.34
▸ GAA P10253 1/20 0.34
▸ PKM P14618 1/20 0.34
▸ TSHR P16473 1/20 0.34
▸ ABCC9 O60706 2/20 0.34
▸ ABCC8 Q09428 2/20 0.34
▸ KCNJ11 Q14654 2/20 0.34
▸ KCNJ8 Q15842 2/20 0.34
▸ POLB P06746 1/20 0.33
▸ PGR P06401 1/20 0.33
▸ HSD11B1 P28845 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28354339 0.86 ACE2 (0.59) ACE2MEN1KMT2AGAATSHR
SCHEMBL18911179 0.85 ACE2 (0.44) ACE2CNR2ALDH1A1GAAPGR
SCHEMBL547654 0.83 MEN1 (0.41) ACE2ALDH1A1MEN1KMT2AGAA
SCHEMBL18905353 0.80 ACE2 (0.43) ACE2MEN1KMT2AMAPT
SCHEMBL21028351 0.80 KCNJ11 (0.54) ALDH1A1MEN1KMT2AGAAABCC9
SCHEMBL31221872 0.79 SLC2A1 (0.35) ACE2GABRA1GABRB2CNR2PGR
SCHEMBL30537735 0.78 GABRA1 (0.43) GABRA1GABRB2CNR2ALDH1A1
SCHEMBL5682891 0.78 GABRA1 (0.43) GABRA1GABRB2CNR2ALDH1A1
SCHEMBL12262668 0.75 GABRA1 (0.50) GABRA1GABRB2ALDH1A1MEN1KMT2A
SCHEMBL14701285 0.74 ACE2 (0.42) ACE2ALDH1A1TSHRCYP3A4CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579526-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-14 — — US disclosed
US-20200301274-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-24 — — US disclosed
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