SCHEMBL22503208

SCHEMBL22503208

O=C(NS(=O)(=O)C(F)(F)F)c1cc(F)cc(F)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 2/20 0.43
▸ CES1 P23141 2/20 0.43
▸ CA1 P00915 1/20 0.40
▸ CA2 P00918 1/20 0.40
▸ HTR7 P34969 1/20 0.40
▸ SCN5A Q14524 1/20 0.40
▸ SCN9A Q15858 1/20 0.40
▸ HDAC1 Q13547 5/20 0.38
▸ HDAC6 Q9UBN7 5/20 0.38
▸ SLC6A3 Q01959 1/20 0.38
▸ PTGS2 P35354 2/20 0.37
▸ PTGS1 P23219 1/20 0.37
▸ HDAC3 O15379 2/20 0.37
▸ HDAC2 Q92769 2/20 0.37
▸ HDAC4 P56524 1/20 0.37
▸ HDAC7 Q8WUI4 1/20 0.37
▸ HDAC10 Q969S8 1/20 0.37
▸ HDAC11 Q96DB2 1/20 0.37
▸ HDAC8 Q9BY41 1/20 0.37
▸ HDAC9 Q9UKV0 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26163067 0.89 EGFR (0.41) CES2CES1CA1CA2HTR7
SCHEMBL22503185 0.84 CES2 (0.45) CES2CES1CA1CA2HTR7
SCHEMBL26163053 0.83 HDAC1 (0.62) CES2CES1HDAC1HDAC6NPC1
SCHEMBL22503128 0.81 PTGS2 (0.49) CES2CES1CA1CA2HTR7
SCHEMBL22503330 0.80 FLT1 (0.54) CA1CA2SCN5ASCN9ARAB9A
SCHEMBL22503187 0.80 CA1 (0.34) CES2CES1CA1CA2HTR7
SCHEMBL26163074 0.80 NOTUM (0.39) CA1CA2HTR7SCN5ASCN9A
SCHEMBL22503305 0.77 CES2 (0.48) CES2CES1HTR7SCN5ASCN9A
SCHEMBL22789926 0.77 SCN5A (0.40) CA1CA2HTR7SCN5ASCN9A
SCHEMBL22503087 0.77 HDAC6 (0.48) CA1CA2SCN5ASCN9AHDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
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