Sulfuric Acid

Sulfuric Acid

SCHEMBL2252829

C=CCN(C)C.O=S(=O)(O)O

nearest known ligand 0.34

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
CA5A P35218 1/20 0.32
CA5B Q9Y2D0 1/20 0.32
AOC3 Q16853 1/20 0.31
C5AR1 P21730 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30
ESR1 P03372 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL3272552 1.00 ALDH1A1 (0.34) ALDH1A1MEN1KMT2ACA5ACA5B
SCHEMBL10362128 0.86 MEN1 (0.38) ALDH1A1MEN1KMT2A
Sulfuric Acid SCHEMBL5321193 0.84 PYCR1 (0.36) ALDH1A1MEN1KMT2ACA5ACA5B
Sulfuric Acid SCHEMBL5168347 0.84 PYCR1 (0.36) ALDH1A1MEN1KMT2ACA5ACA5B
SCHEMBL4177390 0.83
SCHEMBL43114 0.83
SCHEMBL7140363 0.83 PTGS1 (0.34)
Sulfuric Acid SCHEMBL28912679 0.82 PYCR1 (0.35) ALDH1A1MEN1KMT2ACA5ACA5B
Bicarbonate SCHEMBL28060031 0.81 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL21327797 0.81 CA1 (0.32) ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4050080-A1 WATERPROOF, OILPROOF AGENT COMPOSITION AND METHOD FOR PRODUCING SAME AGC INC. (JP) 2022-08-31 EP disclosed
US-20220204667-A1 WATER- AND OIL-PROOFING COMPOSITION AND METHOD FOR ITS PRODUCTION AGC Inc. (JP) 2022-06-30 US disclosed
CN-114616375-A Water and oil proofing composition and method for producing same AGC株式会社 2022-06-10 CN disclosed
WO-2021079774-A1 WATERPROOF, OILPROOF AGENT COMPOSITION AND METHOD FOR PRODUCING SAME AGC株式会社 2021-04-29 WO disclosed
CN-110461301-A Oil-in-water cosmetic SHISEIDO CO LTD 2019-11-15 CN disclosed
CN-110049753-A Oil-in-water type composition 株式会社资生堂 2019-07-23 CN disclosed
CN-105940291-B Protectant for electron microscope observation of biological sample in aqueous state, kit, method for observation, diagnosis, evaluation, and quantification by electron microscope, and sample stage 国立研究开发法人科学技术振兴机构 2019-03-08 CN disclosed
US-10183502-B2 Pretreatment agent for ink jet textile printing and ink jet textile printing process SEIKO EPSON CORPORATION (JP) 2019-01-22 US disclosed
CN-105040441-B Ink jet printing method 精工爱普生株式会社 2017-12-19 CN disclosed
US-20170136782-A1 PRETREATMENT AGENT FOR INK JET TEXTILE PRINTING AND INK JET TEXTILE PRINTING PROCESS SEIKO EPSON CORPORATION (JP) 2017-05-18 US disclosed
CN-105040441-A INK JET TEXTILE PRINTING METHOD SEIKO EPSON CORP 2015-11-11 CN disclosed
CN-102162192-B Pretreatment agent for ink jet textile printing and ink jet textile printing method SEIKO EPSON CORP. (JP) 2015-08-05 CN disclosed
CN-104619747-A Organic polymer thin film, and method for producing same JAPAN SCIENCE & TECH AGENCY 2015-05-13 CN disclosed
CN-103843106-A Electron-microscopic examination method for examining biosample while keeping said biosample unchanged, and composition for evaporation inhibition under vacuum, scanning electron microscope, and transmission electron microscope for use in said method JAPAN SCIENCE & TECH AGENCY 2014-06-04 CN disclosed
CN-102271649-A Free-flowing emulsion concentrates 2011-12-07 CN disclosed
EP-2362014-A2 Pretreatment agent for ink jet textile printing and ink jet textile printing process Seiko Epson Corporation (JP) 2011-08-31 EP disclosed
CN-102162192-A Pretreatment agent for ink jet textile printing and ink jet textile printing method SEIKO EPSON CORP 2011-08-24 CN disclosed
US-20110200751-A1 PRETREATMENT AGENT FOR INK JET TEXTILE PRINTING AND INK JET TEXTILE PRINTING PROCESS SEIKO EPSON CORPORATION (JP) 2011-08-18 US disclosed
US-20030214757-A1 Ramp for magnetic read/write apparatus and magnetic read/write apparatus using the same KABUSHIKI KAISHA TOSHIBA (JP) 2003-11-20 US disclosed
CN-1044295-A The perfume microcapsules that is used for granular detergent compositions PROCTER & GAMBLE (US) 1990-08-01 CN disclosed