SCHEMBL22558035

SCHEMBL22558035

CC(=O)Oc1cc(S(=O)(=O)O)ccc1O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.49
HSD17B10 Q99714 2/20 0.49
KDM4E B2RXH2 2/20 0.49
HPGD P15428 1/20 0.49
POLB P06746 1/20 0.44
MAPT P10636 1/20 0.44
PKM P14618 1/20 0.44
PIM1 P11309 1/20 0.42
KMT2A Q03164 1/20 0.40
SERPINE1 P05121 3/20 0.40
LMNA P02545 1/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA7 P43166 2/20 0.39
CA9 Q16790 1/20 0.39
TSHR P16473 2/20 0.39
GAA P10253 1/20 0.39
RAB9A P51151 1/20 0.39
NT5E P21589 2/20 0.38
NSD2 O96028 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9787581 0.86 TSHR (0.53) ALDH1A1KDM4EPOLBMAPTPKM
SCHEMBL10590245 0.81 ACHE (0.53) ALDH1A1HSD17B10KDM4EHPGDPOLB
SCHEMBL16020414 0.81 TSHR (0.53) ALDH1A1KDM4EPOLBMAPTKMT2A
Guaiacolsulfonic Acid SCHEMBL1802443 0.80 PTGS2 (0.55) ALDH1A1HSD17B10KDM4EHPGDPOLB
Guaiacolsulfonic Acid SCHEMBL31572113 0.80 PTGS2 (0.55) ALDH1A1HSD17B10KDM4EHPGDPOLB
SCHEMBL28806134 0.79 ALDH1A1 (0.49) ALDH1A1HSD17B10KDM4EHPGDMAPT
Guaiacolsulfonic Acid SCHEMBL2125543 0.79 PTGS2 (0.54) ALDH1A1HSD17B10KDM4EHPGDPOLB
Guaiacolsulfonic Acid SCHEMBL27996300 0.79 PTGS2 (0.54) ALDH1A1HSD17B10KDM4EHPGDPOLB
SCHEMBL9787557 0.78 CA12 (0.47) ALDH1A1HSD17B10KDM4EPOLBMAPT
SCHEMBL11333850 0.78 CA12 (0.47) ALDH1A1HSD17B10KDM4EPOLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020213487-A1 CLEANING FLUID, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER 三菱ケミカル株式会社 2020-10-22 WO disclosed
CN-1639846-A Cleaning liquid and cleaning method for substrate for semiconductor device MITSUBISHI CHEM CORP (JP) 2005-07-13 CN disclosed
CN-1420161-A Substrate surface cleaning liquid and cleaning method MITSUBISHI CHEM IND (JP) 2003-05-28 CN disclosed