Pyrogallol

Pyrogallol

SCHEMBL225781

CC(C)=O.Oc1cccc(O)c1O

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 5/20 0.71
▸ CA2 P00918 5/20 0.71
▸ ALDH1A1 P00352 2/20 0.71
▸ LMNA P02545 2/20 0.71
▸ HPGD P15428 2/20 0.71
▸ ALOX15 P16050 2/20 0.71
▸ HSD17B10 Q99714 2/20 0.71
▸ ADAMTS4 O75173 1/20 0.71
▸ EGFR P00533 1/20 0.71
▸ FYN P06241 1/20 0.71
▸ MMP2 P08253 1/20 0.71
▸ MMP9 P14780 1/20 0.71
▸ MMP8 P22894 1/20 0.71
▸ CA6 P23280 1/20 0.71
▸ CDK2 P24941 1/20 0.71
▸ MMP12 P39900 1/20 0.71
▸ RECQL P46063 1/20 0.71
▸ TDP1 Q9NUW8 1/20 0.71
▸ ADAMTS5 Q9UNA0 1/20 0.71
▸ THRB P10828 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Pyrogallol SCHEMBL9797828 0.92 CA1 (0.67) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL8433563 0.92 CA1 (0.67) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL4595522 0.88 ALDH1A1 (0.55) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL6984242 0.85 CA2 (0.75) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL28002736 0.85 CA1 (0.58) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL10717987 0.85 ALDH1A1 (0.57) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL27409245 0.84 ALDH1A1 (0.86) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL27960967 0.84 ALDH1A1 (0.86) CA1CA2ALDH1A1LMNAHPGD
Pyrogallol SCHEMBL3532 0.84 — —
Pyrogallol SCHEMBL170157 0.84 ALDH1A1 (1.00) CA1CA2ALDH1A1LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1168 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116217788-A Anti-solvent vinyl polymer and synthetic method and application thereof 乐凯华光印刷科技有限公司 2023-06-06 — — CN claimed
CN-112961276-A Solvent-resistant vinyl polymer, and synthesis method and application thereof 乐凯华光印刷科技有限公司 2021-06-15 — — CN claimed
CN-112506004-A Positive photoresist composition for liquid crystal device 安徽邦铭新材料科技有限公司 2021-03-16 — — CN claimed
CN-101734034-B High sensitivity positive thermosensitive CTP plate and preparation method thereof TAIXING CITY ORIENT IND COMPANY 2012-09-19 — — CN claimed
CN-101762976-B Active etherate of pyrogallol acetonide resin as heat-sensitive CTP thermo-sensitive imaging liquid of dissolution inhibitor UNIV BEIJING NORMAL 2012-01-11 — — CN claimed
CN-101762977-B Thermosensitive CTP thermolabile imaging liquid using luminol compound as additive UNIV BEIJING NORMAL 2012-01-11 — — CN claimed
CN-101696257-B Active etherate of pyrogallol acetonide resin and synthesizing method thereof BEIJING NORMAL UNIVERSITY (CN) 2011-12-28 — — CN claimed
CN-101762975-B Thermosensitive cytidine triphosphate (CTP) sensible-heat imaging solution of barbituric acid compound as additive TAIXING CITY ORIENT INDUSTRIAL COMPANY (CN) 2011-12-07 — — CN claimed
CN-101930172-A Thermosensitive CTP thermal-induction imaging liquid taking active etherate of pyrogallol and divinylbenzene polycondensate resin as dissolution inhibitor TAIXING CITY ORIENT IND COMPANY 2010-12-29 — — CN claimed
CN-101762977-A Thermosensitive CTP thermolabile imaging liquid using luminol compound as additive UNIV BEIJING NORMAL 2010-06-30 — — CN claimed
US-5457003-A Polysiloxane, polysilsesquioxane NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1995-10-10 — — US claimed
EP-0644460-A1 Positive working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-03-22 — — EP claimed
US-5364731-A Images on multilayer elements formed by development, transferring to receivers KONICA CORPORATION (JP) 1994-11-15 — — US claimed
US-5360692-A Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent FUJI PHOTO FILM CO., LTD. (JP) 1994-11-01 — — US claimed
EP-0385442-B1 Positive-working photoresist composition FUJI PHOTO FILM CO LTD (JP) 1994-06-01 — — EP claimed
EP-0541112-A1 Positive type light-senstitive composition FUJI PHOTO FILM CO., LTD. (JP) 1993-05-12 — — EP claimed
EP-0540032-A1 Photoresist composition and etching method FUJI PHOTO FILM CO., LTD. (JP) 1993-05-05 — — EP claimed
US-5130224-A Naphthoquinonediazide and a light absorbers FUJI PHOTO FILM CO., LTD. (JP) 1992-07-14 — — US claimed
EP-0385442-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1990-09-05 — — EP claimed
EP-0277038-A2 Multi-color transfer image forming method KONICA CORPORATION (JP) 1988-08-03 — — EP claimed
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