Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 12/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.55 |
| ▸ | CA1 | P00915 | 2/20 | 0.53 |
| ▸ | CA2 | P00918 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.45 |
| ▸ | RXRA | P19793 | 1/20 | 0.45 |
| ▸ | RXRB | P28702 | 1/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.45 |
| ▸ | CA3 | P07451 | 1/20 | 0.45 |
| ▸ | TYR | P14679 | 1/20 | 0.45 |
| ▸ | DRD1 | P21728 | 1/20 | 0.45 |
| ▸ | CA4 | P22748 | 1/20 | 0.45 |
| ▸ | CA6 | P23280 | 1/20 | 0.45 |
| ▸ | CA5A | P35218 | 1/20 | 0.45 |
| ▸ | CA7 | P43166 | 1/20 | 0.45 |
| ▸ | CA9 | Q16790 | 1/20 | 0.45 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL386689 | 0.86 | ELANE (0.75) | ELANEHSD17B10CA1CA2KMT2A | |
| SCHEMBL14164107 | 0.84 | ELANE (0.78) | ELANEKMT2A | |
| SCHEMBL22279457 | 0.83 | ELANE (0.55) | ELANEHSD17B10CA1CA2KMT2A | |
| SCHEMBL833149 | 0.82 | ELANE (0.55) | ELANEHSD17B10 | |
| SCHEMBL14012162 | 0.82 | ELANE (0.55) | ELANEHSD17B10 | |
| SCHEMBL809308 | 0.81 | PLA2G2A (0.42) | ELANECA1CA2KMT2ARXRA | |
| SCHEMBL11964033 | 0.80 | ELANE (0.59) | ELANEHSD17B10CA1CA2TP53 | |
| SCHEMBL11991242 | 0.80 | KMT2A (0.53) | ELANEHSD17B10CA1CA2KMT2A | |
| SCHEMBL437118 | 0.80 | ELANE (0.53) | ELANECA1CA2KMT2ACA12 | |
| SCHEMBL809363 | 0.79 | AKR1C3 (0.54) | ELANEKMT2ANR4A2RXRARXRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-11586110-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-11415887-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-11274179-B2 | Method for producing compound having amide bond and also having alkoxysilyl group | CANON KABUSHIKI KAISHA (JP) | 2022-03-15 | — | — | US | disclosed |
| US-20210033971-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-04 | — | — | US | disclosed |
| US-20200339744-A1 | METHOD FOR PRODUCING COMPOUND HAVING AMIDE BOND AND ALSO HAVING ALKOXYSILYL GROUP | CANON KABUSHIKI KAISHA (JP) | 2020-10-29 | — | — | US | disclosed |