SCHEMBL226240

SCHEMBL226240

C=C[Si](c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
TSHR P16473 2/20 0.41
AKT1 P31749 1/20 0.33
ESR1 P03372 1/20 0.32
ESR2 Q92731 1/20 0.32
ALOX15 P16050 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
IDH1 O75874 1/20 0.31
KDM4E B2RXH2 1/20 0.30
MEN1 O00255 1/20 0.30
HPGD P15428 1/20 0.30
KMT2A Q03164 1/20 0.30
TGM2 P21980 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL160241 0.77 ALDH1A1 (0.41) ALDH1A1TSHRAKT1ESR1ESR2
SCHEMBL1674781 0.77 ALDH1A1 (0.41) ALDH1A1TSHRAKT1ESR1ESR2
SCHEMBL11025915 0.76
SCHEMBL29214165 0.76 NFE2L2 (0.41) KDM4E
SCHEMBL23413231 0.75
SCHEMBL8083992 0.73 LMNA (0.33) ALDH1A1TSHRALOX15KDM4EMEN1
SCHEMBL2987804 0.72 ALDH1A1 (0.38) ALDH1A1TSHRAKT1ESR1ESR2
SCHEMBL388506 0.72 ALDH1A1 (0.38) ALDH1A1TSHRAKT1ESR1ESR2
SCHEMBL4352107 0.72 TSHR (0.38) ALDH1A1TSHRAKT1ESR1ESR2
SCHEMBL15302926 0.72 ALDH1A1 (0.38) ALDH1A1TSHRAKT1ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 899 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3927782-B1 AN ANTI-RUST COMPOSITION FOR METAL SURFACE AND A METHOD OF ANTI-RUST TREATMENT ON METAL SURFACE CHEMETALL GMBH (DE) 2026-04-08 EP claimed
EP-3521366-B1 CURABLE MODIFIED PETROLEUM RESIN, AND PREPARATION METHOD AND USE THEREOF KOLON INC (KR) 2025-07-30 EP claimed
EP-3647333-B1 CURABLE PETROLEUM RESIN, PREPARATION METHOD THEREFOR, AND USE THEREOF KOLON INC (KR) 2025-06-18 EP claimed
US-12331164-B2 Curable siloxane resin composition KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2025-06-17 US claimed
CN-120137242-A PET substrate double-sided release film with matte effect and preparation method thereof 广东冠晟新材料科技有限公司 2025-06-13 CN claimed
CN-119431666-A High cis-polybutadiene elastomer and preparation method and application thereof 中国石油化工股份有限公司 2025-02-14 CN claimed
US-20250011621-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2025-01-09 US claimed
CN-118957991-A Crease-resistant antibacterial fabric and preparation method thereof 石狮市煜盛鼎丰织造有限公司 2024-11-15 CN claimed
EP-4421137-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2024-08-28 EP claimed
US-12006445-B2 Anti-rust composition for metal surface and a method of anti-rust treatment on metal surface CHEMETALL GMBH (DE) 2024-06-11 US claimed
EP-0067066-B2 Dry-developing resist composition FUJITSU LTD (JP) 1994-01-12 EP claimed
EP-0415073-A2 Substantially transparent flame retardant aromatic polycarbonate compositions GENERAL ELECTRIC COMPANY (US) 1991-03-06 EP claimed
US-4954549-A Substantially transparent flame retardant aromatic polycarbonate compositions GENERAL ELECTRIC COMPANY (US) 1990-09-04 US claimed
US-4756989-A Aluminum or silicon substrate, copolymer resist layer comprising vinyl aromatic, ethylenically unsaturated units ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1988-07-12 US claimed
EP-0067066-B1 DRY-DEVELOPING RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-12-18 EP claimed
EP-0067067-B1 DRY-DEVELOPING NEGATIVE RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-09-25 EP claimed
US-4481279-A Dry-developing resist composition FUJITSU LIMITED (JP) 1984-11-06 US claimed
US-4464455-A Dry-developing negative resist composition FUJITSU LIMITED (JP) 1984-08-07 US claimed
EP-0067067-A2 Dry-developing negative resist composition FUJITSU LIMITED (JP) 1982-12-15 EP claimed
EP-0067066-A2 Dry-developing resist composition FUJITSU LIMITED (JP) 1982-12-15 EP claimed