SCHEMBL226258

SCHEMBL226258

CCC(C)(C)c1[c]cc(C(C)(C)CC)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
MAPT P10636 1/20 0.39
LMNA P02545 1/20 0.37
MAPK1 P28482 1/20 0.37
CASP3 P42574 1/20 0.37
ATM Q13315 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37
POLB P06746 1/20 0.33
CYP2C9 P11712 1/20 0.33
CNR2 P34972 2/20 0.33
MAOB P27338 5/20 0.32
HRH3 Q9Y5N1 5/20 0.32
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL225079 0.78 SHBG (0.48) MAPTMAPK1SMN1; SMN2POLBESR1
SCHEMBL3281904 0.78 NPC1 (0.38) NPC1RAB9AMAPTLMNAMAPK1
SCHEMBL225080 0.76 CNR2 (0.46) CNR2
SCHEMBL8571700 0.76 NPC1 (0.39) NPC1RAB9AMAPTLMNAMAPK1
SCHEMBL779443 0.74 NPC1 (0.58) NPC1RAB9AMAPTLMNAMAPK1
SCHEMBL55370 0.69 NPC1 (0.40) NPC1RAB9AMAPTLMNAMAPK1
SCHEMBL5666453 0.69 NPC1 (0.35) NPC1RAB9AMAPTLMNAMAPK1
SCHEMBL3278926 0.69 NPC1 (0.48) NPC1RAB9AMAPTLMNAMAPK1
SCHEMBL227931 0.69 TSHR (0.40) NPC1RAB9AMAPTLMNAMAPK1
SCHEMBL24071 0.68 NPC1 (0.34) NPC1RAB9ALMNAMAPK1CASP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 212 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11150555-B2 Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same LG CHEM, LTD. (KR) 2021-10-19 US claimed
US-20200033724-A1 PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME LG CHEM, LTD. (KR) 2020-01-30 US claimed
US-7842744-B2 excellent in ultraviolet absorption capability at 380 nm with little bleed-out; resin and an absorber, which is a tris/2-hydroxyphenyl/ triazine compound ADEKA CORPORATION (JP) 2010-11-30 US claimed
EP-1921063-B1 INDOLE COMPOUND, OPTICAL FILTER AND OPTICAL RECORDING MATERIAL ADEKA CORP (JP) 2010-09-01 EP claimed
US-20090258976-A1 excellent in ultraviolet absorption capability at 380 nm with little bleed-out; resin and an absorber, which is a tris/2-hydroxyphenyl/ triazine compound NEGISHI YOSHINORI 2009-10-15 US claimed
US-7553892-B2 excellent in ultraviolet absorption capability at 380 nm with little bleed-out; resin and an absorber, which is a tris/2-hydroxyphenyl/ triazine compound ADEKA CORPORATION (JP) 2009-06-30 US claimed
US-5276163-A Optical disk with improved reflection, cyanine dyes FUJI PHOTO FILM CO., LTD. (JP) 1994-01-04 US claimed
US-11999838-B2 Resin additive composition, thermoplastic resin composition, and molded article thereof ADEKA CORPORATION (JP) 2024-06-04 US disclosed
EP-4372042-A2 RESIN ADDITIVE COMPOSITION, THERMOPLASTIC RESIN COMPOSITION, AND MOLDED ARTICLE THEREOF Adeka Corporation (JP) 2024-05-22 EP disclosed
EP-3424993-B1 RESIN ADDITIVE COMPOSITION, THERMOPLASTIC RESIN COMPOSITION, AND MOLDED ARTICLE THEREOF ADEKA CORP (JP) 2024-05-01 EP disclosed
EP-4350057-A1 THERMOPLASTIC RESIN COMPOSITION, METHOD FOR PRODUCING SHAPED BODY, SHAPED BODY AND USE OF RESIN MATERIAL ADEKA CORPORATION (JP) 2024-04-10 EP disclosed
US-11780990-B2 Particulate ultraviolet absorber and resin composition ADEKA CORPORATION (JP) 2023-10-10 US disclosed
US-11754920-B2 Thermal acid generator and resist composition using same ADEKA CORPORATION (JP) 2023-09-12 US disclosed
US-5501946-A CYANINE DYES ON SUPPORTS WIYH SILVER HALIDE EMULSIONS FUJI PHOTO FILM CO., LTD. (JP) 1996-03-26 US disclosed
US-5395749-A Support with sulfone, sulfide or sulfoxide compound in layer FUJI PHOTO FILM CO., LTD. (JP) 1995-03-07 US disclosed
US-5360711-A COLORFASTNESS, RESISTANCE TO DISCOLORATION FUJI PHOTO FILM CO., LTD. (JP) 1994-11-01 US disclosed
US-5276163-A Optical disk with improved reflection, cyanine dyes FUJI PHOTO FILM CO., LTD. (JP) 1994-01-04 US disclosed
US-5183733-A Cyanine dyes which have spectral sensitizing action for light of long wavelength FUJI PHOTO FILM CO., LTD. (JP) 1993-02-02 US disclosed
US-5171731-A Optical recording medium containing specific cyanine dye FUJI PHOTO FILM CO., LTD. (JP) 1992-12-15 US disclosed
US-4954419-A Has a plurality of peeling layers FUJI PHOTO FILM CO., LTD. (JP) 1990-09-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200033724-A1 PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME ASIC1, PPA1, ATP6AP1 NPC1 4586/4885RAB9A 626/4885MAPT 799/4885
US-11754920-B2 Thermal acid generator and resist composition using same ACSL1, LRBA, GAR1 NPC1 3870/4885RAB9A 2522/4885MAPT 4032/4885
US-11150555-B2 Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same ASIC1, PPA1, ATP6AP1 NPC1 4586/4885RAB9A 626/4885MAPT 799/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.