Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | BACE1 | P56817 | 1/20 | 0.33 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.33 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | GMNN | O75496 | 1/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL22264523 | 0.85 | LMNA (0.43) | LMNATSHRHSD17B10 | |
| SCHEMBL36734 | 0.83 | FDPS (0.32) | TSHR | |
| Methacrylic Acid SCHEMBL26673754 | 0.83 | TSHR (0.33) | TSHRCA2MAPK1GPR84FFAR1 | |
| Methacrylic Acid SCHEMBL1618251 | 0.83 | TSHR (0.33) | TSHRCA2MAPK1GPR84FFAR1 | |
| SCHEMBL28363768 | 0.77 | — | — | |
| SCHEMBL227180 | 0.76 | TSHR (0.42) | TSHRHPGDZDHHC20ZDHHC2CYP3A4 | |
| SCHEMBL9081281 | 0.74 | — | — | |
| SCHEMBL6664366 | 0.74 | FDPS (0.31) | — | |
| SCHEMBL5455576 | 0.73 | TSHR (0.43) | TSHRHPGDZDHHC20ZDHHC2CYP3A4 | |
| Hexane SCHEMBL1603152 | 0.72 | LMNA (0.59) | LMNATSHRHPGDZDHHC20ZDHHC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250289960-A1 | MATERIAL KIT, CURABLE COMPOSITION, FILM FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2025-09-18 | — | — | US | disclosed |
| US-12281187-B2 | Microwell film for bioassay, photosensitive resin composition for formation of the microwell film for bioassay, and method of manufacturing the microwell film for bioassay | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-04-22 | — | — | US | disclosed |
| US-20240416578-A1 | LAYER FORMING COMPOSITION, FILM FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2024-12-19 | — | — | US | disclosed |
| WO-2024204175-A1 | MICROWELL FILM FOR BIOASSAY, METHOD FOR PRODUCING SAME, AND PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROWELL FILM FOR BIOASSAY | 旭化成株式会社 | 2024-10-03 | — | — | WO | disclosed |
| US-20220340700-A1 | MICROWELL FILM FOR BIOASSAY, PHOTOSENSITIVE RESIN COMPOSITION FOR FORMATION OF THE MICROWELL FILM FOR BIOASSAY, AND METHOD OF MANUFACTURING THE MICROWELL FILM FOR BIOASSAY | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-10-27 | — | — | US | disclosed |
| EP-3995518-A1 | MICROWELL FILM FOR BIOASSAY, PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROWELL FILM FOR BIOASSAY, AND METHOD FOR MANUFACTURING MICROWELL FILM FOR BIOASSAY | Asahi Kasei Kabushiki Kaisha (JP) | 2022-05-11 | — | — | EP | disclosed |
| US-11275273-B2 | Optical device and refresh driving method for optical device | KYOTO UNIVERSITY (JP) | 2022-03-15 | — | — | US | disclosed |
| CN-114051514-A | Microporous film for bioassay, photosensitive resin composition for forming microporous film for bioassay, and method for producing microporous film for bioassay | 旭化成株式会社 | 2022-02-15 | — | — | CN | disclosed |
| US-20210191170-A1 | OPTICAL DEVICE AND REFRESH DRIVING METHOD FOR OPTICAL DEVICE | KYOTO UNIVERSITY (JP) | 2021-06-24 | — | — | US | disclosed |
| US-11029597-B2 | Method for producing pattern laminate, method for producing reversal pattern, and pattern laminate | FUJIFILM CORPORATION (JP) | 2021-06-08 | — | — | US | disclosed |
| WO-2010050614-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | WO | disclosed |
| US-20100060986-A1 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100009138-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009287-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009137-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20090283937-A1 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7553544-B2 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2009-06-30 | — | — | US | disclosed |
| US-20090011367-A1 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20050014088-A1 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1455200-A1 | PRECURSOR COMPOSITION FOR OPTICAL RESIN, RESIN FOR OPTICAL USE, OPTICAL ELEMENT, AND OPTICAL ARTICLE | Nikon Corporation (JP) | 2004-09-08 | — | — | EP | disclosed |