Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 4/20 | 0.34 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.30 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22264521 | 0.87 | THRB (0.39) | TSHRHPGDTHRBALDH1A1CYP3A4 | |
| SCHEMBL5455576 | 0.86 | TSHR (0.43) | TSHRHPGDTHRBTHRAALDH1A1 | |
| SCHEMBL18743380 | 0.83 | TSHR (0.41) | TSHRHPGDTHRBTHRAALDH1A1 | |
| SCHEMBL24690713 | 0.78 | TSHR (0.42) | TSHRHPGDTHRBTHRAZDHHC20 | |
| SCHEMBL321551 | 0.78 | TSHR (0.40) | TSHRTHRBALDH1A1 | |
| SCHEMBL18431534 | 0.78 | TSHR (0.39) | TSHRHPGDTHRBTHRAALDH1A1 | |
| SCHEMBL20741394 | 0.77 | FAAH (0.31) | — | |
| SCHEMBL20927046 | 0.77 | TSHR (0.41) | TSHRHPGDTHRBTHRAALDH1A1 | |
| SCHEMBL18469790 | 0.76 | TSHR (0.40) | TSHRHPGDTHRBTHRAZDHHC20 | |
| Acrylic Acid SCHEMBL227182 | 0.76 | LMNA (0.34) | TSHRHPGDCYP3A4ZDHHC20ZDHHC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024204175-A1 | MICROWELL FILM FOR BIOASSAY, METHOD FOR PRODUCING SAME, AND PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROWELL FILM FOR BIOASSAY | 旭化成株式会社 | 2024-10-03 | — | — | WO | disclosed |
| WO-2022202005-A1 | PHOTOCURABLE COMPOSITION FOR FILM FORMATION | 日産化学株式会社 | 2022-09-29 | — | — | WO | disclosed |
| US-11275273-B2 | Optical device and refresh driving method for optical device | KYOTO UNIVERSITY (JP) | 2022-03-15 | — | — | US | disclosed |
| CN-114051514-A | Microporous film for bioassay, photosensitive resin composition for forming microporous film for bioassay, and method for producing microporous film for bioassay | 旭化成株式会社 | 2022-02-15 | — | — | CN | disclosed |
| US-20210191170-A1 | OPTICAL DEVICE AND REFRESH DRIVING METHOD FOR OPTICAL DEVICE | KYOTO UNIVERSITY (JP) | 2021-06-24 | — | — | US | disclosed |
| US-11029597-B2 | Method for producing pattern laminate, method for producing reversal pattern, and pattern laminate | FUJIFILM CORPORATION (JP) | 2021-06-08 | — | — | US | disclosed |
| US-10914987-B2 | Complex and optical element | KYOTO UNIVERSITY (JP) | 2021-02-09 | — | — | US | disclosed |
| WO-2021002388-A1 | MICROWELL FILM FOR BIOASSAY, PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROWELL FILM FOR BIOASSAY, AND METHOD FOR MANUFACTURING MICROWELL FILM FOR BIOASSAY | 旭化成株式会社 | 2021-01-07 | — | — | WO | disclosed |
| US-20200241336-A1 | COMPLEX AND OPTICAL ELEMENT | KYOTO UNIVERSITY (JP) | 2020-07-30 | — | — | US | disclosed |
| US-10373863-B2 | Method of manufacturing porous body, porous body, method of manufacturing device, device, method of manufacturing wiring structure, and wiring structure | FUJIFILM CORPORATION (JP) | 2019-08-06 | — | — | US | disclosed |
| WO-2010050614-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | WO | disclosed |
| US-20100060986-A1 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100009138-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009287-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009137-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20090283937-A1 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7553544-B2 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2009-06-30 | — | — | US | disclosed |
| US-20090011367-A1 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20050014088-A1 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1455200-A1 | PRECURSOR COMPOSITION FOR OPTICAL RESIN, RESIN FOR OPTICAL USE, OPTICAL ELEMENT, AND OPTICAL ARTICLE | Nikon Corporation (JP) | 2004-09-08 | — | — | EP | disclosed |