⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL147891 | 0.70 | THRB (0.31) | — | |
| SCHEMBL18243580 | 0.70 | THRB (0.31) | — | |
| SCHEMBL27891621 | 0.67 | — | — | |
| SCHEMBL16499789 | 0.67 | — | — | |
| SCHEMBL11669348 | 0.64 | — | — | |
| SCHEMBL1577631 | 0.64 | ALDH1A1 (0.35) | — | |
| SCHEMBL2583565 | 0.64 | — | — | |
| SCHEMBL248437 | 0.64 | ALDH1A1 (0.53) | — | |
| SCHEMBL7627796 | 0.62 | — | — | |
| Carbon Tetrachloride SCHEMBL10754436 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210040290-A1 | COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-11 | — | — | US | disclosed |
| EP-3747954-A1 | COMPOSITION, RESIST-PATTERN FORMING METHOD, AND INSULATING-FILM FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-09 | — | — | EP | disclosed |
| CN-111630111-A | Composition, method for forming resist pattern, and method for forming insulating film | 三菱瓦斯化学株式会社 | 2020-09-04 | — | — | CN | disclosed |