SCHEMBL2280244

SCHEMBL2280244

CC(C)(C)OC(=O)c1ccc(C(=O)c2ccc(C(=O)OC(C)(C)C)c(C(=O)OC(C)(C)C)c2)cc1C(=O)OC(C)(C)C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.47
GABRA1 P14867 1/20 0.43
GABRG2 P18507 1/20 0.43
GABRB3 P28472 1/20 0.43
GABRA3 P34903 1/20 0.43
GABRA2 P47869 1/20 0.43
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
CA14 Q9ULX7 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
POLB P06746 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
TSHR P16473 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
SIRT1 Q96EB6 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29439795 0.95 ELANE (0.47) ELANEGABRA1GABRG2GABRB3GABRA3
SCHEMBL29439802 0.93 KDM4E (0.47) ELANEGABRA1GABRG2GABRB3GABRA3
SCHEMBL828480 0.91 GABRA1 (0.48) ELANEGABRA1GABRG2GABRB3GABRA3
SCHEMBL829131 0.87 KDM4E (0.43) ELANEGABRA1GABRG2GABRB3GABRA3
SCHEMBL4737753 0.85 HSD17B10 (0.44) ELANEGABRA1GABRG2GABRB3GABRA3
SCHEMBL2280259 0.84 L3MBTL1 (0.38) ELANEL3MBTL1POLBTDP1TSHR
SCHEMBL2874165 0.84 KDM4E (0.56) CA12CA1CA2CA9CA14
SCHEMBL27534696 0.82 KDM4E (0.46) GABRA1GABRG2GABRB3GABRA3GABRA2
SCHEMBL81645 0.82 ALDH1A1 (0.51) ELANEL3MBTL1POLBTDP1TSHR
SCHEMBL32689847 0.82 ALDH1A1 (0.51) ELANEL3MBTL1POLBTDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-4300981-A None JP disclosed
US-8840992-B2 Curable resin composition and optical film JNC CORPORATION (JP) 2014-09-23 US disclosed
US-20110189470-A1 CURABLE RESIN COMPOSITION AND OPTICAL FILM CHISSO CORPORATION (JP) 2011-08-04 US disclosed
EP-0709438-B1 Active energy ray-curable composition recording medium and image-forming method employing the same CANON KK (JP) 2003-04-23 EP disclosed
US-6143363-A INK RECEIVER LAYER FOR PRINTING OF VARIOUS PRODUCTS POOR IN ABSORPTION OF WATER-BASED INK, CANON KABUSHIKI KAISHA (JP) 2000-11-07 US disclosed
US-5910390-A SELECTIVELY POLYMERIZING A PHOTOPOLYMERIZABLE RESIN, A RADICAL GENERATOR AND A SENSITIZING AGENT BY UTILIZING RADIATED LIGHT; HIGH RESOLUTION WITHOUT USE OF NEGATIVE FILM NITTO BOSEKI CO., LTD. (JP) 1999-06-08 US disclosed
US-5861194-A POLYAMINES FROM EPICHLOROHYDRIN AND AMINES AND ADDITION POLYMERS CANON KABUSHIKI KAISHA (JP) 1999-01-19 US disclosed
US-5798397-A PHOTOCURABLE ACRYLIC OR METHACRYLIC ESTERS OR AMIDES CONTAINING TETRAALKYL AMMONIUM GROUP; CURING CANON KABUSHIKI KAISHA (JP) 1998-08-25 US disclosed
US-5681643-A INK-RECEIVING LAYER COMPRISING A CATIONIC POLYACRYLOYL POLYMER; PHOTOPOLYMERIZATION CANON KABUSHIKI KAISHA (JP) 1997-10-28 US disclosed
EP-0738608-A2 Curable compositions and their use for the formation of a printing material CANON KABUSHIKI KAISHA (JP) 1996-10-23 EP disclosed
EP-0709438-A1 Active energy ray-curable composition recording medium and image-forming method employing the same CANON KABUSHIKI KAISHA (JP) 1996-05-01 EP disclosed
US-5284735-A Mixture of radical-polymerizable compound having two or more double bonds, photoinitiator, high molecular weight organic compound and di-substituted ethylene compound OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) 1994-02-08 US disclosed
JP-H04300981-A PRESSURE-SENSITIVE ADHESIVE COMPOSITION FUJIKURA KASEI CO LTD 1992-10-23 JP disclosed