SCHEMBL2282867

SCHEMBL2282867

Cc1nc(C)c(O)c(O)c1N

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
KDM4E B2RXH2 2/20 0.32
LMNA P02545 2/20 0.32
GAA P10253 1/20 0.32
MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2279621 0.83 ALDH1A1 (0.33) ALDH1A1L3MBTL1KDM4ELMNAGAA
SCHEMBL2282478 0.78 NQO2 (0.33)
SCHEMBL2282238 0.77 SRC (0.33)
SCHEMBL2285907 0.73 LMNA (0.38) ALDH1A1L3MBTL1KDM4ELMNAMAPT
SCHEMBL11717411 0.72 ALDH1A1 (0.40) ALDH1A1L3MBTL1KDM4ELMNAMAPT
SCHEMBL2842749 0.71 ALDH1A1 (0.46) ALDH1A1KDM4ELMNAGAAMAPT
SCHEMBL2840770 0.71 ALDH1A1 (0.36) ALDH1A1L3MBTL1KDM4ELMNAMAPT
Hydrochloric Acid SCHEMBL3685807 0.67 KDM4E (0.37) ALDH1A1KDM4ELMNA
SCHEMBL1251696 0.67 IDO1 (0.39) ALDH1A1L3MBTL1KDM4ELMNAMAPT
SCHEMBL7608160 0.67 LMNA (0.33) ALDH1A1L3MBTL1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110115116-B Method for forming solderable solder deposits on contact pads 德国艾托特克公司 2022-05-27 CN disclosed
US-11032914-B2 Method of forming a solderable solder deposit on a contact pad ATOTECH DEUTSCHLAND GMBH (DE) 2021-06-08 US disclosed
EP-3560304-B1 METHOD OF FORMING A SOLDERABLE SOLDER DEPOSIT ON A CONTACT PAD ATOTECH DEUTSCHLAND GMBH (DE) 2021-02-03 EP disclosed
US-20190350088-A1 METHOD OF FORMING A SOLDERABLE SOLDER DEPOSIT ON A CONTACT PAD ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) 2019-11-14 US disclosed
EP-3560304-A1 METHOD OF FORMING A SOLDERABLE SOLDER DEPOSIT ON A CONTACT PAD ATOTECH Deutschland GmbH (DE) 2019-10-30 EP disclosed
EP-2377376-B1 METHOD TO FORM SOLDER DEPOSITS ON SUBSTRATES ATOTECH DEUTSCHLAND GMBH (DE) 2019-08-07 EP disclosed
US-8507376-B2 Method to form solder deposits on substrates ATOTECH DEUTSCHLAND GMBH (DE) 2013-08-13 US disclosed
EP-2377376-A1 METHOD TO FORM SOLDER DEPOSITS ON SUBSTRATES ATOTECH Deutschland GmbH (DE) 2011-10-19 EP disclosed
CN-102187749-A Method to form solder deposits on substrates ATOTECH DEUTSCHLAND GMBH 2011-09-14 CN disclosed
US-20110189848-A1 METHOD TO FORM SOLDER DEPOSITS ON SUBSTRATES ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) 2011-08-04 US disclosed
WO-2010046235-A1 METHOD TO FORM SOLDER DEPOSITS ON SUBSTRATES ATOTECH DEUTSCHLAND GMBH (DE) 2010-04-29 WO disclosed