SCHEMBL22840993

SCHEMBL22840993

C=C(C)C(=O)OC12CCC3CC(CC(C1)C(=O)O3)C2

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.38
TSHR P16473 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14997755 0.89 NAAA (0.40) NAAATSHRNPSR1
SCHEMBL74710 0.89 NAAA (0.40) NAAATSHRNPSR1
SCHEMBL17668300 0.89 NAAA (0.40) NAAATSHRNPSR1
SCHEMBL13649556 0.81 NAAA (0.34) NAAA
SCHEMBL4817900 0.78 NAAA (0.32) NAAA
SCHEMBL12016944 0.77 TSHR (0.39) NAAATSHRNPSR1
SCHEMBL16943705 0.77 NAAA (0.35) NAAATSHRNPSR1
SCHEMBL14648992 0.77 NAAA (0.35) NAAATSHRNPSR1
SCHEMBL12285232 0.77 TSHR (0.33) NAAATSHRNPSR1
SCHEMBL1141561 0.77 NAAA (0.32) NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3757676-A1 PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD THEREFOR, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-12-30 EP disclosed