Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14997755 | 1.00 | NAAA (0.40) | NAAATSHRNPSR1 | |
| SCHEMBL17668300 | 1.00 | NAAA (0.40) | NAAATSHRNPSR1 | |
| SCHEMBL22840993 | 0.89 | NAAA (0.38) | NAAATSHRNPSR1 | |
| SCHEMBL13649556 | 0.89 | NAAA (0.34) | NAAA | |
| SCHEMBL14648992 | 0.87 | NAAA (0.35) | NAAATSHRNPSR1 | |
| SCHEMBL12016944 | 0.87 | TSHR (0.39) | NAAATSHRNPSR1 | |
| SCHEMBL16943705 | 0.87 | NAAA (0.35) | NAAATSHRNPSR1 | |
| SCHEMBL27047579 | 0.87 | NAAA (0.37) | NAAATSHRNPSR1 | |
| SCHEMBL1141561 | 0.87 | NAAA (0.32) | NAAA | |
| SCHEMBL17236485 | 0.87 | NAAA (0.43) | NAAATSHRNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 286 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-7033726-B2 | Photoresist polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-7015291-B2 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| EP-1584634-A1 | POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2005-10-12 | — | — | EP | disclosed |
| US-20050158662-A1 | Adamantane derivatives and resin compositions using the same as raw material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-07-21 | — | — | US | disclosed |
| US-20050100815-A1 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-12 | — | — | US | disclosed |
| US-20050014087-A1 | Photoresist polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6486330-B1 | 4-oxatricyclo[4.3.1.1 3,8]undecan-5-one derivative and process for producing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-26 | — | — | US | disclosed |
| EP-1081150-A1 | 4-Oxatricyclo(4.3.1.1-3,8)undecan-5-one derivatives and process for producing the same | Daicel Chemical Industries, Ltd. (JP) | 2001-03-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | LCP1, DOT1L, PRMT1 | NAAA 4592/4885TSHR 4727/4885NPSR1 2057/4885 |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | NAAA 3660/4885TSHR 3135/4885NPSR1 1541/4885 |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | NAAA 748/4885TSHR 1473/4885NPSR1 3193/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | NAAA 4305/4885TSHR 839/4885NPSR1 643/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.