Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL74710 | 0.87 | NAAA (0.40) | NAAA | |
| SCHEMBL14997755 | 0.87 | NAAA (0.40) | NAAA | |
| SCHEMBL17668300 | 0.87 | NAAA (0.40) | NAAA | |
| SCHEMBL1141648 | 0.81 | NAAA (0.35) | NAAA | |
| SCHEMBL1141527 | 0.81 | NAAA (0.35) | NAAA | |
| SCHEMBL13649556 | 0.77 | NAAA (0.34) | NAAA | |
| SCHEMBL22840993 | 0.77 | NAAA (0.38) | NAAA | |
| SCHEMBL7006533 | 0.76 | — | — | |
| SCHEMBL12016944 | 0.76 | TSHR (0.39) | NAAA | |
| SCHEMBL14648992 | 0.76 | NAAA (0.35) | NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8753793-B2 | Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8637623-B2 | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-8530134-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8470510-B2 | Polymer for lithographic purposes and method for producing same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-8236971-B2 | Polycyclic ester containing cyano group and lactone skeleton | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2012-08-07 | — | — | US | disclosed |
| EP-1930328-B1 | CYANO-CONTAINING POLYCYCLIC ESTERS HAVING LACTONE SKELETONS | DAICEL CHEM (JP) | 2012-06-13 | — | — | EP | disclosed |
| US-20110244394-A1 | METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110065044-A1 | POLYMER FOR LITHOGRAPHIC PURPOSES AND METHOD FOR PRODUCING SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110040056-A1 | PROCESS FOR PRODUCTION OF POLYMER | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110028743-A1 | POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON | INOUE KEIZO | 2011-02-03 | — | — | US | disclosed |
| US-20100081778-A1 | POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON | INOUE KEIZO | 2010-04-01 | — | — | US | disclosed |
| EP-1676869-B1 | PHOTORESIST RESIN AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEM (JP) | 2009-10-14 | — | — | EP | disclosed |
| US-20080319160-A1 | Polycyclic Ester Containing Cyano Group and Lactone Skeleton | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2008-12-25 | — | — | US | disclosed |
| US-7407733-B2 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.04,8] nonan-3-one ring and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-05 | — | — | US | disclosed |
| EP-1930328-A1 | CYANO-CONTAINING POLYCYCLIC ESTERS HAVING LACTONE SKELETONS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2008-06-11 | — | — | EP | disclosed |
| US-20060281022-A1 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-14 | — | — | US | disclosed |
| US-7105268-B2 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20060160247-A1 | Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-20 | — | — | US | disclosed |
| EP-1676869-A1 | PHOTORESIST RESIN AND PHOTORESIST RESIN COMPOSITION | Daicel Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | LCP1, DOT1L, PRMT1 | NAAA 4592/4885 |
| US-20060160247-A1 | Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition | HCAR1, HCAR2, RARA | NAAA 485/4885 |
| US-20110028743-A1 | POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON | LSS, COASY, CYP8B1 | NAAA 761/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.