SCHEMBL22876002

SCHEMBL22876002

OC1(c2cc3ccccc3c3ccccc23)c2ccccc2-c2cc3ccccc3cc21

nearest known ligand 0.44

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.40
▸ HIF1A Q16665 2/20 0.40
▸ HSD17B10 Q99714 2/20 0.40
▸ HPGD P15428 1/20 0.40
▸ TSHR P16473 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ CASP1 P29466 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ TRPM4 Q8TD43 1/20 0.39
▸ CYP11B1 P15538 1/20 0.38
▸ PDK2 Q15119 13/20 0.38
▸ CYP1B1 Q16678 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22876004 0.93 TRPM4 (0.44) ALDH1A1HIF1AHSD17B10HPGDTSHR
SCHEMBL17656822 0.88 ALDH1A1 (0.46) ALDH1A1HIF1AHSD17B10HPGDTSHR
SCHEMBL22875999 0.85 SLC6A3 (0.40) ALDH1A1HIF1AHSD17B10HPGDTSHR
SCHEMBL22876057 0.82 CYP1A2 (0.42) ALDH1A1HIF1AHSD17B10HPGDTSHR
SCHEMBL19395213 0.79 PDK2 (0.49) ALDH1A1HIF1AHSD17B10HPGDTSHR
SCHEMBL19395211 0.79 PDK2 (0.49) ALDH1A1HIF1AHSD17B10HPGDTSHR
SCHEMBL18167756 0.78 PDK2 (0.41) PDK2
SCHEMBL16801626 0.76 ALOX5 (0.44) ALDH1A1HSD17B10HPGDPDK2
SCHEMBL23800102 0.75 SLC6A4 (0.44) PDK2
SCHEMBL12938481 0.75 PDK2 (0.43) PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 — — US disclosed
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 — — US disclosed
US-20210011384-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-14 — — US disclosed
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