SCHEMBL2289194

SCHEMBL2289194

C=COCc1ccccc1CC=C(C)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
SLC22A12 Q96S37 7/20 0.39
AKR1C3 P42330 1/20 0.38
SLC2A9 Q9NRM0 1/20 0.36
KDM4E B2RXH2 3/20 0.36
PTPRC P08575 1/20 0.35
PTPN1 P18031 1/20 0.35
BACE1 P56817 1/20 0.34
CYP2C9 P11712 1/20 0.34
ALDH1A1 P00352 1/20 0.33
APEX1 P27695 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2114167 0.79 ALDH1A1 (0.35) SLC22A12AKR1C3PTPRCPTPN1BACE1
SCHEMBL2286191 0.77 PTPRC (0.38) SLC22A12PTPRCPTPN1CYP2C9ALDH1A1
SCHEMBL1683260 0.76 AKR1C3 (0.43) SLC22A12AKR1C3SLC2A9BACE1CYP2C9
SCHEMBL6474057 0.76 AKR1C3 (0.43) SLC22A12AKR1C3SLC2A9BACE1CYP2C9
SCHEMBL6474065 0.76 AKR1C3 (0.43) SLC22A12AKR1C3SLC2A9BACE1CYP2C9
SCHEMBL29728038 0.75 IDO1 (0.38) KDM4EALDH1A1SMN1; SMN2
SCHEMBL8602403 0.75 IDO1 (0.38) KDM4EALDH1A1SMN1; SMN2
SCHEMBL11395760 0.74 CTBP2 (0.47) SLC22A12AKR1C3SLC2A9KDM4EBACE1
SCHEMBL5421666 0.74 AKR1B1 (0.50) SLC22A12AKR1C3SLC2A9BACE1CYP2C9
SCHEMBL17595074 0.74 AKR1B1 (0.50) SLC22A12AKR1C3SLC2A9BACE1CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
EP-3460013-B1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORP (JP) 2020-08-12 EP disclosed
US-10590297-B2 Ink jet composition set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2020-03-17 US disclosed
EP-3470477-A1 RADIATION-CURABLE INK JET INK COMPOSITION AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-04-17 EP disclosed
US-20190092957-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2019-03-28 US disclosed
EP-3460013-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-03-27 EP disclosed
US-9925801-B2 Ink jet recording method, ultraviolet curable ink, and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2018-03-27 US disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9827760-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-11-28 US disclosed
US-9782982-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-10 US disclosed
US-20140292969-A1 IMAGE RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2014-10-02 US disclosed
US-8664291-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2014-03-04 US disclosed
US-20130286121-A1 INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2013-10-31 US disclosed
US-20130286095-A1 PRINT APPARATUS AND PRINT METHOD SEIKO EPSON CORPORATION (JP) 2013-10-31 US disclosed
US-20130258018-A1 INK JET RECORDING METHOD, ULTRAVIOLET CURABLE INK, AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-20130258015-A1 ULTRAVIOLET RAY-CURABLE CLEAR INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-8236872-B2 Adhesive composition and optical member CHEIL INDUSTRIES, INC. (KR) 2012-08-07 US disclosed
US-20110195249-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2011-08-11 US disclosed
US-7763686-B2 Having a narrow molecular weight distribution in a short amount of time and with good productivity by mixing a first Lewis acid with a proton source to generate initiator cations, and adding a vinyl ether and a second Lewis acid to initiate a high-speed polymerization CANON KABUSHIKI KAISHA (JP) 2010-07-27 US disclosed
US-20060194935-A1 Process for producing polyalkenyl ether CANON KABUSHIKI KAISHA (JP) 2006-08-31 US disclosed