SCHEMBL2286191

SCHEMBL2286191

C=COCc1cccc(CC=C(C)C(=O)O)c1

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PTPRC P08575 1/20 0.38
PTPN1 P18031 1/20 0.38
CYP2C9 P11712 1/20 0.35
HCAR2 Q8TDS4 2/20 0.35
PTGS2 P35354 1/20 0.35
ALDH1A1 P00352 1/20 0.35
MAOB P27338 6/20 0.35
CYP2C19 P33261 1/20 0.34
SLC22A12 Q96S37 2/20 0.33
MAOA P21397 2/20 0.33
MEN1 O00255 1/20 0.33
CYP3A4 P08684 1/20 0.33
KMT2A Q03164 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MRGPRX4 Q96LA9 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2114167 0.85 ALDH1A1 (0.35) PTPRCPTPN1CYP2C9ALDH1A1MAOB
SCHEMBL7044262 0.79 CTBP2 (0.47) CYP2C9SLC22A12CYP3A4
SCHEMBL3371588 0.78 PTGS2 (0.43) CYP2C9PTGS2ALDH1A1SLC22A12MEN1
SCHEMBL7804308 0.78 PTGS2 (0.43) CYP2C9PTGS2ALDH1A1SLC22A12MEN1
SCHEMBL2289194 0.77 SLC22A12 (0.39) PTPRCPTPN1CYP2C9ALDH1A1SLC22A12
SCHEMBL869687 0.76 IDO1 (0.38) PTPRCPTPN1MAOBCYP3A4
SCHEMBL5487172 0.76 CTBP2 (0.50) CYP2C9ALDH1A1MAOBCYP3A4TDP1
SCHEMBL6441999 0.75 MEN1 (0.54) ALDH1A1MEN1KMT2ATDP1MRGPRX4
SCHEMBL6441996 0.75 MEN1 (0.54) ALDH1A1MEN1KMT2ATDP1MRGPRX4
SCHEMBL30528 0.75 CYP2C9 (0.51) CYP2C9ALDH1A1MAOBMEN1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
EP-3460013-B1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORP (JP) 2020-08-12 EP disclosed
US-10590297-B2 Ink jet composition set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2020-03-17 US disclosed
EP-3470477-A1 RADIATION-CURABLE INK JET INK COMPOSITION AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-04-17 EP disclosed
US-20190092957-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2019-03-28 US disclosed
EP-3460013-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-03-27 EP disclosed
US-9925801-B2 Ink jet recording method, ultraviolet curable ink, and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2018-03-27 US disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9827760-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-11-28 US disclosed
US-9782982-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-10 US disclosed
US-20140362152-A1 ULTRAVIOLET-CURABLE INK COMPOSITION FOR INK JET AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2014-12-11 US disclosed
US-20140292969-A1 IMAGE RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2014-10-02 US disclosed
US-8664291-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2014-03-04 US disclosed
US-20130286121-A1 INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2013-10-31 US disclosed
US-20130258015-A1 ULTRAVIOLET RAY-CURABLE CLEAR INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-20130258018-A1 INK JET RECORDING METHOD, ULTRAVIOLET CURABLE INK, AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-8236872-B2 Adhesive composition and optical member CHEIL INDUSTRIES, INC. (KR) 2012-08-07 US disclosed
US-20110195249-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2011-08-11 US disclosed
US-7763686-B2 Having a narrow molecular weight distribution in a short amount of time and with good productivity by mixing a first Lewis acid with a proton source to generate initiator cations, and adding a vinyl ether and a second Lewis acid to initiate a high-speed polymerization CANON KABUSHIKI KAISHA (JP) 2010-07-27 US disclosed
US-20060194935-A1 Process for producing polyalkenyl ether CANON KABUSHIKI KAISHA (JP) 2006-08-31 US disclosed