SCHEMBL2114167

SCHEMBL2114167

C=COCc1ccc(CC=C(C)C(=O)O)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.35
PTGS1 P23219 1/20 0.33
CYP2C9 P11712 1/20 0.33
TRPA1 O75762 1/20 0.33
AKR1C3 P42330 1/20 0.33
PPARG P37231 1/20 0.32
MAOB P27338 1/20 0.32
PTPRC P08575 1/20 0.32
PTPN2 P17706 1/20 0.32
PTPN1 P18031 1/20 0.32
SMN1; SMN2 Q16637 3/20 0.32
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32
ALOX15 P16050 1/20 0.32
TSHR P16473 1/20 0.32
ALOX12 P18054 1/20 0.32
FFAR1 O14842 1/20 0.32
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2286191 0.85 PTPRC (0.38) ALDH1A1CYP2C9MAOBPTPRCPTPN1
SCHEMBL5421635 0.80 CA2 (0.45) CYP2C9TRPA1AKR1C3SLC22A12BACE1
SCHEMBL2289194 0.79 SLC22A12 (0.39) ALDH1A1CYP2C9AKR1C3PTPRCPTPN1
SCHEMBL7177427 0.79 AKR1C3 (0.39) ALDH1A1CYP2C9TRPA1AKR1C3PPARG
SCHEMBL316896 0.79 AKR1C3 (0.39) ALDH1A1CYP2C9TRPA1AKR1C3PPARG
SCHEMBL869595 0.78 AKR1C3 (0.37) ALDH1A1CYP2C9TRPA1AKR1C3PPARG
SCHEMBL8945443 0.77 ALDH1A1 (0.49) ALDH1A1CYP2C9TSHRMAPK1L3MBTL1
SCHEMBL7634733 0.76 TRPA1 (0.42) CYP2C9TRPA1AKR1C3PPARGTSHR
SCHEMBL15301308 0.76 ALDH1A1 (0.48) ALDH1A1CYP2C9TRPA1AKR1C3PPARG
SCHEMBL7634720 0.76 TRPA1 (0.42) CYP2C9TRPA1AKR1C3PPARGTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
EP-3460013-B1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORP (JP) 2020-08-12 EP disclosed
US-10590297-B2 Ink jet composition set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2020-03-17 US disclosed
EP-3470477-A1 RADIATION-CURABLE INK JET INK COMPOSITION AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-04-17 EP disclosed
US-20190092957-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2019-03-28 US disclosed
EP-3460013-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-03-27 EP disclosed
US-9925801-B2 Ink jet recording method, ultraviolet curable ink, and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2018-03-27 US disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9827760-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-11-28 US disclosed
US-9782982-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-10 US disclosed
US-20120229583-A1 PHOTOCURABLE INK COMPOSITION, INK JET RECORDING METHOD, AND RECORDING MATTER SEIKO EPSON CORPORATION (JP) 2012-09-13 US disclosed
US-8236872-B2 Adhesive composition and optical member CHEIL INDUSTRIES, INC. (KR) 2012-08-07 US disclosed
US-8192804-B2 Photocurable ink composition, ink jet recording method, and recording matter SEIKO EPSON CORPORATION (JP) 2012-06-05 US disclosed
US-20120133059-A1 RADIATION CURABLE INK JET COMPOSITION, RECORDED MATTER, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-05-31 US disclosed
US-8158214-B2 Photocurable ink composition set, ink jet recording method, and recorded matter SEIKO EPSON CORPORATION (JP) 2012-04-17 US disclosed
US-20110195249-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2011-08-11 US disclosed
US-20100310835-A1 Coating Agent for Plastic Label, and Plastic Label FUJI SEAL INTERNATIONAL, INC. (JP) 2010-12-09 US disclosed
US-7763686-B2 Having a narrow molecular weight distribution in a short amount of time and with good productivity by mixing a first Lewis acid with a proton source to generate initiator cations, and adding a vinyl ether and a second Lewis acid to initiate a high-speed polymerization CANON KABUSHIKI KAISHA (JP) 2010-07-27 US disclosed
US-20090041946-A1 Photocuable Ink Composition Set, Ink Jet Recording Method, and Recorded Matter SEIKO EPSON CORPORATION (JP) 2009-02-12 US disclosed
US-20060194935-A1 Process for producing polyalkenyl ether CANON KABUSHIKI KAISHA (JP) 2006-08-31 US disclosed