SCHEMBL22904993

SCHEMBL22904993

CN(C1CCCCC1)S(=O)(=O)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 1/20 0.44
USP2 O75604 1/20 0.41
HPGD P15428 1/20 0.41
HSD17B10 Q99714 1/20 0.41
ADH1C P00326 2/20 0.39
ADH1A P07327 2/20 0.39
GAA P10253 3/20 0.38
LMNA P02545 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.37
MCOLN3 Q8TDD5 2/20 0.36
HTT P42858 2/20 0.36
PKM P14618 1/20 0.36
ADH1B P00325 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
HTR2A P28223 1/20 0.34
HTR2C P28335 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16057796 0.89 HTR2A (0.37) ALDH1A1MEN1KMT2AKDM4EUSP2
SCHEMBL2202660 0.78 SERPINE1 (0.36) ALDH1A1MEN1KMT2AKDM4EADH1C
SCHEMBL7856508 0.78 ADH1A (0.33) ALDH1A1MEN1KMT2AKDM4EADH1C
SCHEMBL11345793 0.76 MEN1 (0.33) ALDH1A1MEN1KMT2AKDM4EGAA
SCHEMBL762461 0.73 ALDH1A1 (0.50) ALDH1A1MEN1KMT2AKDM4EUSP2
SCHEMBL24052200 0.71 ALDH1A1 (0.48) ALDH1A1MEN1KMT2AKDM4EUSP2
SCHEMBL2185721 0.71 ALDH1A1 (0.48) ALDH1A1MEN1KMT2AKDM4EUSP2
SCHEMBL2592782 0.71 ALDH1A1 (0.48) ALDH1A1MEN1KMT2AKDM4EUSP2
SCHEMBL3364682 0.71 ALDH1A1 (0.48) ALDH1A1MEN1KMT2AKDM4EUSP2
SCHEMBL12256397 0.71 ADH1A (0.35) ALDH1A1MEN1KMT2AKDM4EUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210364920-A1 RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2021-11-25 US disclosed
US-20210181632-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-17 US disclosed
US-20210018836-A1 PHOTORESIST COMPOSITION FOR THICK FILM AND METHOD OF FORMING THICK FILM PHOTORESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-01-21 US disclosed